Modeling oblique incidence effects in photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Pistor, Thomas V ^a   Neureuther, Andrew R ^a   Socha, Robert J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT SCATTERING; MASKS; MATHEMATICAL MODELS; SEMICONDUCTOR DEVICE MANUFACTURE;

PHASE SHIFT MASKS (PSM); PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 0033720546     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)