Determination of the flare specification and methods to meet the CD control requirements for the 32 nm node using EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 86-95

  Chandhok, Manish ^a   Lee, Sang H ^a   Krautschik, Christof ^a   Rice, Bryan J ^a   Panning, Eric ^a   Goldstein, Michael ^a   Shell, Melissa ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Dummification; EUV; Flare; Flare variation compensation; FVC; Negative tone; Scattering bars; Tiling

Indexed keywords

DUMMIFICATION; EUV; FLARE VARIATION COMPENSATION (FVC); NEGATIVE TONE; SCATTERING BARS; TILING;

COMPUTER SIMULATION; DIES; LIGHT SCATTERING; MIRRORS; SENSITIVITY ANALYSIS; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 3843087238     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536024     Document Type: Conference Paper

References (4)

1. S. H. Lee, P. Naulleau, C. Krautschik, M. Chandhok, Proceedings of the SPIE, vol.5037, 2003. p. 103-11.
2. S. H.Lee, M.Chandhok, C.Krautschik, M.Goldstein, Proceedings of the SPIE, vol.5374, 2004 (this journal).
3. M. Chandhok, S. H. Lee, J. Swanson, P. Naulleau, JVST-B (to be published).
4. C.G Krautschik, M. Chandhok, G. Zhang, S. H. Lee; Proceedings of the SPIE, vol.5037, 2003. p. 58-68