Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 2, 2004, Pages 747-757

  Houle, F A ^a   Hinsberg, W D ^a   Sanchez, M I ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ACIDITY; AMMONIUM COMPOUNDS; CATALYSIS; COMPOSITION; CONCENTRATION (PROCESS); CURVE FITTING; DIFFUSION; DISSOCIATION; IMAGE ANALYSIS; IRRADIATION; PHOTORESISTS; POLYSTYRENES; SOLVENTS;

DEPROTECTION; NEUTRALIZATION; PHOTOGENERATED ACIDS; POSTEXPOSURE;

RATE CONSTANTS;

EID: 2342513468     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1688351     Document Type: Article

References (18)

1. Y. Kawai, A. Otaka, A. Tanaka, and T. Matsuda, Jpn. J. Appl. Phys., Part 1 33, 7023 (1994).
2. K. Asakawa, T. Oshirogouchi, and M. Nakase, Proc. SPIE 2438, 563 (1995).
3. W. Huang, Proc. SPIE 3678, 1040 (1999).
4. S. Funato, N. Kawasaki, Y. Kinoshita, S. Masuda, H. Okazaki, M. Padmanaban, T. Yamamoto, and G. Pawlowski, Proc. SPIE 2724, 186 (1996).
5. L. Ferreira, S. Malik, T. R. Sarrubi, A. J. Blakeney, and B. Maxwell, Proc. SPIE 3333, 236 (1998).
6. H. Fukuda, K. Hattori, and T. Hagiwara, Proc. SPIE 4346, 319 (2001); K. Hattori, S. Hotta, T. Hagiwara, and H. Fukuda, J. Photopolym. Sci. Technol. 13, 477 (2000).
7. H. Fukuda, K. Hattori, and T. Hagiwara, Proc. SPIE 4346, 319 (2001); K. Hattori, S. Hotta, T. Hagiwara, and H. Fukuda, J. Photopolym. Sci. Technol. 13, 477 (2000).
8. W. D. Hinsberg, F. A. Houle, M. I. Sanchez, M. E. Morrison, G. M. Wallraff, C. E. Larson, J. A. Hoffnagle, P. J. Brock, and G. Breyta, Proc. SPIE 3999, 148 (2000).
9. F. A. Houle, W. D. Hinsberg, M. Morrison, M. I. Sanchez, G. Wallraff, C. Larson, and J. Hoffnagle, J. Vac. Sci. Technol. B 18, 1874 (2000).
10. F. A. Houle, W. D. Hinsberg, M. I. Sanchez, and J. A. Hoffnagle, J. Vac. Sci. Technol. B 20, 924 (2002).
11. G. Wallraff, J. Hutchinson, W. Hinsberg, F. Houle, P. Seidel, R. Johnson, and W. Oldham, J. Vac. Sci. Technol. B 12, 3857 (1994).
12. H. Ito (unpublished); J. W. Thackeray, M. A. Braintree, and P. R. Hagerty, U.S. Patent No. 5,879,856 (March 9, 1999).
13. Additional models for base neutralization kinetics including metathesis and formation of a photodecomposible base were explored in Ref. 7, and found to not match experiment.
14. M. Heskins and J. Guillet, Macromolecules 3, 224 (1970).
15. G. M. Wallraff (unpublished).
16. W. Hinsberg, F. Houle, M. Sanchez, and G. Wallraff, IBM J. Res. Dev. 45, 667 (2001).
17. W. D. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, J. Vac. Sci. Technol. B 16, 3689 (1998).
18. M. D. Smith and C. A. Mack, Proc. SPIE 4345, 1022 (2001), and references therein.