Development of 157 nm positive resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2678-2684

  Ito, H ^a   Wallraff, G M ^a   Fender, N ^a   Brock, P J ^a   Hinsberg, W D ^a   Mahorowala, A ^a   Larson, C E ^a   Truong, H D ^a   Breyta, G ^a   Allen, R D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEHYDRATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROLYSIS; INITIATORS (CHEMICAL); LITHOGRAPHY; MONOMERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; ORGANIC POLYMERS; POLYMERIZATION; STYRENE; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS;

CONVENTIONAL RADICAL POLYMERIZATION; HEXAFLUOROISOPROPANOL; TRANSITION-METAL-INITIATED ADDITION POLYMERIZATION; TRIFLUOROMETHYLACRYLIC ACID;

PHOTORESISTS;

EID: 0000589801     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1415512     Document Type: Article

References (21)

1. R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D. K. Downs, and J. E. Curtin, Proc. SPIE 3678, 13 (1999).
2. H. Ito, N. Seehof, R. Sato, T. Nakayama, and M. Ueda, ACS Symposium Series 706, Micro- and Nano-Patterning Polymers, edited by H. Ito, E. Reichmanis, O. Nalamasu, and T. Ueno (American Chemical Society, Washington, DC, 1998), p. 208.
3. H. Ito, D. C. Miller, and C. G. Willson, Macromolecules 15, 915 (1982).
4. H. Ito and R. Schwalm, in Recent Advances in Anionic Polymerization, edited by T. E. Hogen-Esch and J. Smid (Elsevier, New York, 1987), p. 421.
5. C. G. Willson, H. Ito, D. C. Miller, and T. G. Tessier, Polym. Eng. Sci. 23, 1000 (1983).
6. N. N. Matsuzawa, S. Mori, E. Yano, S. Okazaki, A. Ishitani, and D. A. Dixon, Proc. SPIE 3999, 375 (2000).
7. T. Chiba, R. J. Hung, S. Yamada, B. Trinque, M. Yamachika, C. Brodsky, K. Paterson, A. V. Heyden, A. Jamison, S.-H. Lin, M. Somerville, J. Byers, W. Conley, and C. G. Willson, J. Photopolym. Sci. Technol. 13, 657 (2000).
8. R. A. Darrall, F. Smith, M. Stacey, and J. C. Tatlow, J. Chem. Soc. 1951, 2329 (1951).
9. M. W. Buxton, M. Stacey, and J. C. Tatlow, J. Chem. Soc. 1954, 366 (1954).
10. K. J. Przybilla, H. Roschert, and G. Pawlowski, Proc. SPIE 1672, 500 (1992).
11. H. Ito, C. Dalby, A. Pomerantz, M. Sherwood, R. Sato, R. Sooriyakumaran, K. Guy, and G. Breyta, Macromolecules 33, 5080 (2000).
12. H. Ito, D. Miller, N. Sveum, and M. Sherwood, J. Polym. Sci., Part A: Polym. Chem. 38, 3521 (2000).
13. H. Ito, D. Fenzel-Alexander, and G. Breyta, J. Photopolym. Sci. Technol. 10, 397 (1997).
14. H. Ito, R. D. Allen, J. Opitz, T. I. Wallow, H. D. Truong, D. C. Hofer, P. R. Varanasi, G. M. Jordhamo, S. Jayaraman, and R. Vicari, Proc. SPIE 3999, 2 (2000).
15. H. Ito, D. Miller, and M. Sherwood, J. Photopolym. Sci. Technol. 13, 559 (2000).
16. W. D. Hinsberg, S. A. MacDonald, and N. Clecak, Chem. Mater. 6, 481 (1994).
17. H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo, and D. Seeger, J. Photopolym. Sci. Technol. 7, 433 (1994).
18. N. Fender, P. J. Brock, W. Chau, S. Bangsaruntip, A. Mahorowala, G. M. Wallraff, W. D. Hinsberg, C. E. Larson, H. Ito, G. Breyta, K. Burnham, H. Truong, P. Lawson, and R. D. Allen, Proc. SPIE 4345, 417 (2001).
19. P. R. Kunz, R. F. Sinta, M. Sworin, W. A. Mowers, T. H. Fedynyshyn, V. Liberman, and J. E. Curtin, Proc. SPIE 4345, 285 (2001).
20. H. Ito, G. M. Wallraff, P. Brock, N. Fender, H. Truong, G. Breyta, D. C. Miller, M. H. Sherwood, and R. D. Allen, Proc. SPIE 4345, 273 (2001).
21. H. Ito and M. Sherwood, J. Photopolym. Sci. Technol. 12, 625 (1999).