Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Kang, Shuhui ^a   Prabhu, Vivek M ^a   Vogt, Bryan D ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Turnquest, Karen ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

Copolymer; Diffusion; FTIR; PAG; Photoacid; Photolithography; Photoresists; Reaction rate constants

Indexed keywords

FTIR; PAG; PHOTOACIDS; REACTION RATE CONSTANTS;

COPOLYMERS; DIFFUSION; HYDROGEN BONDS; MONOMERS; PHOTOLITHOGRAPHY; RATE CONSTANTS; REACTION KINETICS;

PHOTORESISTS;

EID: 33745633605     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656594     Document Type: Conference Paper

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