Synthesis of silicon carbide films by combined implantation with sputtering techniques

Applied Surface Science

Volumn 253, Issue 20, 2007, Pages 8428-8434

  Li, Gaobao ^a   Zhang, Jizhong ^a,b   Meng, Qingli ^a   Li, Wenzhi ^a  

^a TSINGHUA UNIVERSITY   (China)

^b INTERNATIONAL CENTRE FOR MATERIALS PHYSICS   (China)

Author keywords

IBAD; Ion implantation; MEVVA; Silicon carbide

Indexed keywords

ION BEAM ASSISTED DEPOSITION; ION IMPLANTATION; NANOHARDNESS; NANOINDENTATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

METAL VAPOR VACUUM ARC (MEVVA); SUBSTRATE TEMPERATURE;

SILICON CARBIDE;

EID: 34548542613     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.04.014     Document Type: Article

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