Mechanical properties of PECVD a-SiC:H thin films prepared from methyltrichlorosilane

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6533-6537

  Ivashchenko, V I ^a   Dub, S N ^a   Porada, O K ^a   Ivashchenko, L A ^a   Skrynskyy, P L ^a   Stegniy, A I ^a  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

Nanohardness; PECVD; SiC:H thin films; Wear resistance

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; HARDNESS; INFRARED SPECTROSCOPY; MECHANICAL PROPERTIES; SILICON CARBIDE; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS;

HYDROGENATED FILMS; METHYLTRICHLOROSILANE; NANOHARDNESS; SILICON CARBIDE THIN FILMS;

THIN FILMS;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; HARDNESS; INFRARED SPECTROSCOPY; MECHANICAL PROPERTIES; SILICON CARBIDE; THIN FILMS; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS;

EID: 33748127185     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.087     Document Type: Article

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