Plasma assisted process for deposition of silicon carbide thin films

Current Applied Physics

Volumn 6, Issue 2, 2006, Pages 161-165

  Cho, N I ^a   Choi, Y ^a   Noh, S J ^b  

^a SunMoon University   (South Korea)

^b Dankook University   (South Korea)

Author keywords

Chemical vapor deposition (CVD); Plasma assisted process; Silicon carbide (SiC); Thin film

Indexed keywords

DEPOSITION; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE;

LASER TREATMENT; PLASMA ASSISTED PROCESS; PLASMA CHEMICAL MERTHOD; REACTION GAS;

THIN FILMS;

EID: 27744544713     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2005.07.031     Document Type: Conference Paper

References (6)

1. H. Matsunami Mater. Sci. Forum 389 2002 3
2. A.L. Spetz, P. Tobias, A. Baranzahi, P. Martensson, and I. Lundstom IEEE Trans. Electron Dev. ED-46 1999 561
3. N.I. Cho, S. Vlaskina, and C.K. Kim Adv. Tech. Mat. Mat. Proc. J. 4 2002 96
4. J. Lee, and S.W. Rhee Handbook of Chemical Vapor Deposition 1993 Bando Press Seoul
5. Y.B. Park, and S.W. Rhee J. Mater. Sci. 12 2001 515
6. N.I. Cho, Y.M. Kim, C. Hong, Y. Yul, and C.K. Kim Thin Solid Films 409 2002 1