Ion energy measurements in vacuum arc deposition

IEEE Transactions on Plasma Science

Volumn 25, Issue 4, 1997, Pages 700-702

  Yang, Lei ^a,b   Zou, Jiyan ^a,c   Cheng, Zhongyuan ^b,c  

^a UNIVERSITY OF GEORGIA   (United States)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

Author keywords

Combined ion parameter; Electrostatic energy analyzer; Ion energy; Vacuum arc deposition

Indexed keywords

ELECTRIC ARCS; ELECTROSTATICS; IONS; SPUTTER DEPOSITION; VACUUM APPLICATIONS;

ELECTROSTATIC ENERGY ANALYZERS; VACUUM ARC DEPOSITION;

PLASMA APPLICATIONS;

EID: 0031207988     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.640689     Document Type: Article

References (6)

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2. J. Musil et al., "Ion assisted sputtering of TiN films," Surf. Coat. Technol., vol. 43/44, pp. 259-265, 1990.
3. H. Wang et al., "Investigations of plasma parameters in vacuum arc coating," in Proc. 15th Int. Symp. Discharge Electric Insulation Vacuum, Darmstadt, 1992, pp. 315-318.
4. Z. Cheng et al., "Plasma diagnostics with Langmuir probe in the process of VAD," in Proc. 17th ISDEIV, vol. II, Berkeley, 1996, pp. 858-862.
5. M. Lindmayer et al., "Measurement of the plasma parameters of high current arc in vacuum interrupters," in Proc. 7th Int. Conf. Switching Arc Phenomena, Lodz, 1993, pp. 326-329.
6. S. Kadlec et al., "TiN films grown by reactive magnetron sputtering with enhanced ionization at low discharge pressures," Vacuum, vol. 41, pp. 2233-2238, 1990.