Microstructural and optical properties of aluminum oxide thin films prepared by off-plane filtered cathodic vacuum arc system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 906-910

  Zhao, Z W ^a   Tay, B K ^a   Lau, S P ^a   Xiao, C Y ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS MATERIALS; FAST FOURIER TRANSFORMS; MICROSTRUCTURE; MORPHOLOGY; OPTICAL COATINGS; OPTICAL PROPERTIES; PARTIAL PRESSURE; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; VACUUM TECHNOLOGY; X RAY DIFFRACTION ANALYSIS;

OFF-PLANE FILTERED CATHODIC VACUUM ARC SYSTEM; OPTICAL CONSTANTS; OXYGEN PARTIAL PRESSURES; TRANSMITTANCE; X-RAY PHOTOEMISSION SPECTROSCOPY;

THIN FILMS;

EID: 0042531728     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1577132     Document Type: Article

References (30)

1. G. Emiliani and S. Scaglione, J. Vac. Sci. Technol. A 5, 1824 (1987).
2. W. D. Sproul, M. E. Graham, M. S. Wong, S. Lopez, D. Li, and R. A. Scholl, J. Vac. Sci. Technol. A 13, 1188 (1995).
3. M. Aguilar-Frutis, M. Garcia, and C. Falcony, Appl. Phys. Lett. 72, 1700 (1998).
4. C. H. Lin, H. L. Wang, and M. H. Hon, Thin Solid Films 283, 171 (1996).
5. J. Gottmann, A. Husmann, T. Klotzbucher, and E. W. Kreutz, Surf. Coat. Technol. 100, 415 (1998).
6. S. Anders, A. Anders, M. Rubin, Z. Wang, S. Raoux, F. Kong, and I. G. Brown, Surf. Coat. Technol. 76, 167 (1995).
7. P. J. Kelly, P. S. Henderson, R. D. Arnell, G. A. Roche, and D. Carter, J. Vac. Sci. Technol. A 18, 2890 (2000).
8. A. Bendavid, P. J. Martin, X. Wang, M. Wittling, and T. J. Kinder, J. Vac. Sci. Technol. A 13, 1658 (1995).
9. H. Takikawa, K. Kimura, R. Miyano, and T. Sakakibara, Thin Solid Films 377, 74 (2000).
10. T. Zhang, J. H. Song, X. B. Tian, P. K. Chu, and I. G. Brown, J. Vac. Sci. Technol. A 19, 2048 (2001).
11. Y. H. Cheng, B. K. Tay, S. P. Lau, and X. Shi, J. Vac. Sci. Technol. A 19, 736 (2001).
12. H. Randhawa, J. Vac. Sci. Technol. A 7, 2346 (1989).
13. H. Bolt, F. Koch, J. L. Rodet, D. Karpov, and S. Menzel, Surf. Coat. Technol. 116, 956 (1999).
14. X. Shi, B. K. Tay, and H. S. Tan, U.S. Patent No. 6031239 (29 February 2000).
15. X. Shi, B. K. Tay, and S. P. Lau, Int. J. Mod. Phys. B 14, 136 (2000).
16. S. W. Whangbo, Y. K. Choi, H. K. Jang, Y. D. Chung, I. W. Lyo, and C. N. Whang, Thin Solid Films 388, 290 (2001).
17. E. Ciliberto, I. Fragala, R. Rizza, G. Spoto, and G. C. Allen, Appl. Phys. Lett. 67, 1624 (1995).
18. W. Theiss, in Scout Thin Film Analysis Software Handbook, edited by M. Theiss (Hard- and Software, Aachen, Germany); www.mtheiss.com
19. S. K. O'Leary, S. R. Johnson, and P. K. Lim, J. Appl. Phys. 82, 3334 (1997).
20. S. Venkateraj, J. Geurts, H. Weis, O. Kappertz, W. K. Njoroge, R. Jayavel, and M. Wuttig, J. Vac. Sci. Technol. A 19, 2870 (2001).
21. C. Y. Xiao, Z. W. Zhao, and B. K. Tay, Thin Solid Films (submitted).
22. J. P. Lehan, R. B. Sargent, and R. E. Klinger, J. Vac. Sci. Technol. A 10, 3401 (1992).
23. L.-J. Meng, M. Andritschky, and M. P. dos Santos, Thin Solid Films 223, 242 (1993).
24. L. Parfitt, M. Goldiner, J. W. Jones, and G. S. Was, J. Appl. Phys. 77, 3029 (1995).
25. A. Bendavid, P. J. Martin, and H. Takikawa, Thin Solid Films 360, 241 (2000).
26. C. R. Ottermann and K. Bange, Thin Solid Films 286, 32 (1996).
27. M. K. Olsson, K. Macak, U. Helmerss, and B. Hjorvarsson, J. Vac. Sci. Technol. A 16, 639 (1998).
28. S. J. Yun, K. H. Lee, J. Skarp, H. Kim, and K. Nam, J. Vac. Sci. Technol. A 15, 2993 (1997).
29. T. Maruyama and S. Arrai, Appl. Phys. Lett. 60, 322 (1992).
30. G. Hass and E. Ritter, J. Vac. Sci. Technol. 4, 71 (1966).