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Journal of Applied Physics

Volumn 101, Issue 12, 2007, Pages

Structural, morphological, and optical properties of AlGaN/GaN heterostructures with AlN buffer and interlayer

(6) Corekci S a Ozturk M K a Akaoglu B a Cakmak M a Ozelik S a Ozbay E b

a GAZI UNIVERSITY (Turkey)

b BILKENT UNIVERSITY (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER LAYERS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; STRUCTURAL PROPERTIES; SURFACE MORPHOLOGY; X RAY DIFFRACTION;

CRYSTAL QUALITY; HIGH-RESOLUTION X-RAY DIFFRACTION; HIGH-TEMPERATURE (HT) INTERLAYERS; TERNARY LAYER (TL);

HETEROJUNCTIONS;

EID: 34547395386 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2747216 Document Type: Article

Times cited : (45)

References (35)

1
- 79956006500
- 0003-6951 10.1063/1.1461420
- S. Arulkumaran, T. Egawa, H. Ishikawa, and T. Jimbo, Appl. Phys. Lett. 0003-6951 10.1063/1.1461420 80, 2186 (2002).
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2186
- Arulkumaran, S.¹ Egawa, T.² Ishikawa, H.³ Jimbo, T.⁴

2
- 0000925636
- 0953-8984 10.1088/0953-8984/13/32/317
- H. Xing, S. Keller, Y. -F. Wu, L. McCarthy, I. P. Smorchkova, D. Buttari, R. Coffie, D. S. Green, G. Parish, S. Heikman, L. Shen, N. Zhang, J. J. Xu, B. P. Keller, S. P. DenBaars, and U. K. Mishra, J. Phys.: Condens. Matter 0953-8984 10.1088/0953-8984/13/32/317 13, 7139 (2001).
- (2001) J. Phys.: Condens. Matter , vol.13 , pp. 7139
- Xing, H.¹ Keller, S.² Wu, Y.-F.³ McCarthy, L.⁴ Smorchkova, I.P.⁵ Buttari, D.⁶ Coffie, R.⁷ Green, D.S.⁸ Parish, G.⁹ Heikman, S.¹⁰ Shen, L.¹¹ Zhang, N.¹² Xu, J.J.¹³ Keller, B.P.¹⁴ Denbaars, S.P.¹⁵ Mishra, U.K.¹⁶

3
- 4944232118
- 0003-6951 10.1063/1.1790073
- M. Miyoshi, H. Ishikawa, T. Egawa, K. Asai, M. Mouri, T. Shibita, M. Tanaka, and O. Oda, Appl. Phys. Lett. 0003-6951 10.1063/1.1790073 85, 1710 (2004).
- (2004) Appl. Phys. Lett. , vol.85 , pp. 1710
- Miyoshi, M.¹ Ishikawa, H.² Egawa, T.³ Asai, K.⁴ Mouri, M.⁵ Shibita, T.⁶ Tanaka, M.⁷ Oda, O.⁸

4
- 26244439041
- 0021-8979 10.1063/1.2060946
- M. Miyoshi, T. Egawa, H. Ishikawa, K. -I. Asai, T. Shibita, M. Tanaka, and O. Oda, J. Appl. Phys. 0021-8979 10.1063/1.2060946 98, 063713 (2005).
- (2005) J. Appl. Phys. , vol.98 , pp. 063713
- Miyoshi, M.¹ Egawa, T.² Ishikawa, H.³ Asai, K.-I.⁴ Shibita, T.⁵ Tanaka, M.⁶ Oda, O.⁷

5
- 33750575441
- 0169-4332
- C. Wang, X. Wang, G. Hu, J. Wang, J. Li, and Z. Wang, Appl. Surf. Sci. 253, 762 (2006). 0169-4332
- (2006) Appl. Surf. Sci. , vol.253 , pp. 762
- Wang, C.¹ Wang, X.² Hu, G.³ Wang, J.⁴ Li, J.⁵ Wang, Z.⁶

6
- 33644853778
- 0022-0248
- C. Wang, X. Wang, G. Hu, J. Wang, H. Xiao, and J. Li, J. Cryst. Growth 289, 415 (2006). 0022-0248
- (2006) J. Cryst. Growth , vol.289 , pp. 415
- Wang, C.¹ Wang, X.² Hu, G.³ Wang, J.⁴ Xiao, H.⁵ Li, J.⁶

7
- 0032048780
- 0021-8979 10.1063/1.366585
- N. G. Weimann and L. F. Eastman, J. Appl. Phys. 0021-8979 10.1063/1.366585 83, 3656 (1998).
- (1998) J. Appl. Phys. , vol.83 , pp. 3656
- Weimann, N.G.¹ Eastman, L.F.²

8
- 1842655826
- 0003-6951 10.1063/1.114486
- D. Kapolnek, X. H. Wu, B. Heying, S. Keller, B. P. Keller, U. K. Mishra, S. P. DenBaars, and J. S. Speck, Appl. Phys. Lett. 0003-6951 10.1063/1.114486 67, 1541 (1995).
- (1995) Appl. Phys. Lett. , vol.67 , pp. 1541
- Kapolnek, D.¹ Wu, X.H.² Heying, B.³ Keller, S.⁴ Keller, B.P.⁵ Mishra, U.K.⁶ Denbaars, S.P.⁷ Speck, J.S.⁸

9
- 0029637531
- 0003-6951 10.1063/1.113252
- S. D. Lester, F. A. Ponce, M. G. Craford, and D. A. Steigerwald, Appl. Phys. Lett. 0003-6951 10.1063/1.113252 66, 1249 (1995).
- (1995) Appl. Phys. Lett. , vol.66 , pp. 1249
- Lester, S.D.¹ Ponce, F.A.² Craford, M.G.³ Steigerwald, D.A.⁴

10
- 26244443807
- 0021-4922 10.1143/JJAP.44.6490
- M. Miyoshi, A. Imanishi, T. Egawa, H. Ishikawa, K. Asai, T. Shibita, M. Tanaka, and O. Oda, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.44.6490 44, 6490 (2005).
- (2005) Jpn. J. Appl. Phys., Part 1 , vol.44 , pp. 6490
- Miyoshi, M.¹ Imanishi, A.² Egawa, T.³ Ishikawa, H.⁴ Asai, K.⁵ Shibita, T.⁶ Tanaka, M.⁷ Oda, O.⁸

11
- 33746466569
- 0022-0248
- H. B. Yu, M. K. Ozturk, S. Ozcelik, and E. Ozbay, J. Cryst. Growth 293, 273 (2006). 0022-0248
- (2006) J. Cryst. Growth , vol.293 , pp. 273
- Yu, H.B.¹ Ozturk, M.K.² Ozcelik, S.³ Ozbay, E.⁴

12
- 0142038457
- 0021-8979 10.1063/1.371866
- O. Ambacher, B. Foutz, J. Smart, J. R. Shealy, N. G. Weimann, K. Chu, M. Murphy, A. J. Sierakowski, W. J. Schaff, and L. F. Eastman, J. Appl. Phys. 0021-8979 10.1063/1.371866 87, 334 (2000).
- (2000) J. Appl. Phys. , vol.87 , pp. 334
- Ambacher, O.¹ Foutz, B.² Smart, J.³ Shealy, J.R.⁴ Weimann, N.G.⁵ Chu, K.⁶ Murphy, M.⁷ Sierakowski, A.J.⁸ Schaff, W.J.⁹ Eastman, L.F.¹⁰

13
- 0037279895
- 1071-1023 10.1116/1.1556398
- S. Arulkumaran, T. Egawa, H. Ishikawa, and T. Jimbo, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1556398 21, 888 (2003).
- (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 888
- Arulkumaran, S.¹ Egawa, T.² Ishikawa, H.³ Jimbo, T.⁴

14
- 33646262582
- 1610-1634
- C. Wang, X. Wang, G. Hu, J. Wang, and J. Li, Phys. Status Solidi C 3, 486 (2006). 1610-1634
- (2006) Phys. Status Solidi C , vol.3 , pp. 486
- Wang, C.¹ Wang, X.² Hu, G.³ Wang, J.⁴ Li, J.⁵

15
- 0033897018
- 0361-5235 10.1007/s11664-000-0087-3
- G. Parish, S. Keller, S. P. Denbaars, and U. K. Mishra, J. Electron. Mater. 0361-5235 10.1007/s11664-000-0087-3 29, 15 (2000).
- (2000) J. Electron. Mater. , vol.29 , pp. 15
- Parish, G.¹ Keller, S.² Denbaars, S.P.³ Mishra, U.K.⁴

16
- 0001708926
- 0021-8979 10.1063/1.371602
- S. Keller, G. Parish, P. T. Fini, S. Heikman, C. -H. Chen, N. Zhang, S. P. DenBaars, U. K. Mishra, and Y. -F. Yu, J. Appl. Phys. 0021-8979 10.1063/1.371602 86, 5850 (1999).
- (1999) J. Appl. Phys. , vol.86 , pp. 5850
- Keller, S.¹ Parish, G.² Fini, P.T.³ Heikman, S.⁴ Chen, C.-H.⁵ Zhang, N.⁶ Denbaars, S.P.⁷ Mishra, U.K.⁸ Yu, Y.-F.⁹

17
- 0000804158
- 0021-8979 10.1063/1.371396
- I. P. Smorchkova, C. R. Elsass, J. P. Ibbetson, R. Vetury, B. Heying, P. Fini, E. Haus, S. P. DenBaars, J. S. Speck, and U. K. Mishra, J. Appl. Phys. 0021-8979 10.1063/1.371396 86, 4520 (1999).
- (1999) J. Appl. Phys. , vol.86 , pp. 4520
- Smorchkova, I.P.¹ Elsass, C.R.² Ibbetson, J.P.³ Vetury, R.⁴ Heying, B.⁵ Fini, P.⁶ Haus, E.⁷ Denbaars, S.P.⁸ Speck, J.S.⁹ Mishra, U.K.¹⁰

18
- 0001590229
- 0021-8979 10.1063/1.369664
- O. Ambacher, J. Smart, J. R. Shealy, N. G. Weimann, K. Chu, M. Murphy, W. J. Schaff, L. F. Eastman, R. Dimitrov, L. Wittmer, M. Stutzmann, W. Rieger, and J. Hilsenbeck, J. Appl. Phys. 0021-8979 10.1063/1.369664 85, 3222 (1999).
- (1999) J. Appl. Phys. , vol.85 , pp. 3222
- Ambacher, O.¹ Smart, J.² Shealy, J.R.³ Weimann, N.G.⁴ Chu, K.⁵ Murphy, M.⁶ Schaff, W.J.⁷ Eastman, L.F.⁸ Dimitrov, R.⁹ Wittmer, L.¹⁰ Stutzmann, M.¹¹ Rieger, W.¹² Hilsenbeck, J.¹³

19
- 0347373724
- 0003-6951 10.1063/1.126940
- J. P. Ibbetson, P. T. Fini, K. D. Ness, S. P. DenBaars, J. S. Speck, and U. K. Mishra, Appl. Phys. Lett. 0003-6951 10.1063/1.126940 77, 250 (2000).
- (2000) Appl. Phys. Lett. , vol.77 , pp. 250
- Ibbetson, J.P.¹ Fini, P.T.² Ness, K.D.³ Denbaars, S.P.⁴ Speck, J.S.⁵ Mishra, U.K.⁶

20
- 0000620946
- 0021-8979 10.1063/1.1339858
- L. Hsu and W. Walukiewicz, J. Appl. Phys. 0021-8979 10.1063/1.1339858 89, 1783 (2001).
- (2001) J. Appl. Phys. , vol.89 , pp. 1783
- Hsu, L.¹ Walukiewicz, W.²

21
- 0035890369
- 0021-8979 10.1063/1.1412273
- I. P. Smorchkova, L. Chen, T. Mates, L. Shen, S. Heikman, B. Moran, S. Keller, S. P. DenBaars, J. S. Speck, and U. K. Mishra, J. Appl. Phys. 0021-8979 10.1063/1.1412273 90, 5196 (2001).
- (2001) J. Appl. Phys. , vol.90 , pp. 5196
- Smorchkova, I.P.¹ Chen, L.² Mates, T.³ Shen, L.⁴ Heikman, S.⁵ Moran, B.⁶ Keller, S.⁷ Denbaars, S.P.⁸ Speck, J.S.⁹ Mishra, U.K.¹⁰

22
- 0035474079
- 0741-3106 10.1109/55.954910
- L. Shen, S. Heikman, B. Moran, R. Coffie, N. -Q. Zhang, D. Buttari, I. P. Smorckhova, S. Keller, S. P. DenBaars, and U. K. Mishra, IEEE Electron Device Lett. 0741-3106 10.1109/55.954910 22, 457 (2001).
- (2001) IEEE Electron Device Lett. , vol.22 , pp. 457
- Shen, L.¹ Heikman, S.² Moran, B.³ Coffie, R.⁴ Zhang, N.-Q.⁵ Buttari, D.⁶ Smorckhova, I.P.⁷ Keller, S.⁸ Denbaars, S.P.⁹ Mishra, U.K.¹⁰

23
- 2942729973
- 0022-0248 10.1016/j.jcrysgro.2004.04.109
- R. Q. Jin, J. P. Liu, J. C. Zhang, and H. Yang, J. Cryst. Growth 0022-0248 10.1016/j.jcrysgro.2004.04.109 268, 35 (2004).
- (2004) J. Cryst. Growth , vol.268 , pp. 35
- Jin, R.Q.¹ Liu, J.P.² Zhang, J.C.³ Yang, H.⁴

24
- 33846483774
- 0022-2461 10.1007/s10853-006-1056-x
- Z. X. Qin, H. J. Luo, Z. Z. Chen, Y. Lu, T. J. Yu, Z. J. Yang, and G. Y. Zhang, J. Mater. Sci. 0022-2461 10.1007/s10853-006-1056-x 42, 228 (2007).
- (2007) J. Mater. Sci. , vol.42 , pp. 228
- Qin, Z.X.¹ Luo, H.J.² Chen, Z.Z.³ Lu, Y.⁴ Yu, T.J.⁵ Yang, Z.J.⁶ Zhang, G.Y.⁷

25
- 0037442465
- 0021-8979 10.1063/1.1537458
- K. Jeganathan, T. Ide, M. Shimizu, and H. Okumura, J. Appl. Phys. 0021-8979 10.1063/1.1537458 93, 2047 (2003).
- (2003) J. Appl. Phys. , vol.93 , pp. 2047
- Jeganathan, K.¹ Ide, T.² Shimizu, M.³ Okumura, H.⁴

26
- 0035998567
- 1071-1023 10.1116/1.1481874
- A. Torabi, P. Ericson, E. J. Yarranton, and W. E. Hooke, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1481874 20, 1234 (2002).
- (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 1234
- Torabi, A.¹ Ericson, P.² Yarranton, E.J.³ Hooke, W.E.⁴

27
- 0004014461
- 0014-7664
- F. C. Frank, Discuss. Faraday Soc. 5, 67 (1949). 0014-7664
- (1949) Discuss. Faraday Soc. , vol.5 , pp. 67
- Frank, F.C.¹

28
- 0002264213
- edited by B. O.Seraphin (North Holland, Amsterdam
- D. E. Aspnes, in Optical Properties of Solids: New Developments, edited by, B. O. Seraphin, (North Holland, Amsterdam, 1976), p. 799.
- (1976) Optical Properties of Solids: New Developments , pp. 799
- Aspnes, D.E.¹

29
- 0000644435
- 0021-8979 10.1063/1.1342022
- J. Wagner, H. Obloh, M. Kunzer, M. Maier, K. Kohler, and B. Johs, J. Appl. Phys. 0021-8979 10.1063/1.1342022 89, 2779 (2001).
- (2001) J. Appl. Phys. , vol.89 , pp. 2779
- Wagner, J.¹ Obloh, H.² Kunzer, M.³ Maier, M.⁴ Kohler, K.⁵ Johs, B.⁶

30
- 25444460140
- 0031-8965 10.1002/pssa.200460470
- M. Baeumler, S. Muller, K. Kohler, and J. Wagner, Phys. Status Solidi A 0031-8965 10.1002/pssa.200460470 202, 665 (2005).
- (2005) Phys. Status Solidi A , vol.202 , pp. 665
- Baeumler, M.¹ Muller, S.² Kohler, K.³ Wagner, J.⁴

31
- 0141752279
- 0021-8979 10.1063/1.1508420
- F. Yun, M. A. Reshchikov, L. He, T. King, H. Morko̧, S. W. Novak, and L. Wei, J. Appl. Phys. 0021-8979 10.1063/1.1508420 92, 4837 (2002).
- (2002) J. Appl. Phys. , vol.92 , pp. 4837
- Yun, F.¹ Reshchikov, M.A.² He, L.³ King, T.⁴ Morko̧, H.⁵ Novak, S.W.⁶ Wei, L.⁷

32
- 20844448179
- 0003-6951 10.1063/1.1943489
- K. B. Nam, M. L. Nakarmi, J. Y. Lin, and H. X. Jianga, Appl. Phys. Lett. 0003-6951 10.1063/1.1943489 86, 222108 (2005).
- (2005) Appl. Phys. Lett. , vol.86 , pp. 222108
- Nam, K.B.¹ Nakarmi, M.L.² Lin, J.Y.³ Jianga, H.X.⁴

33
- 27844481537
- 0370-1972 10.1002/pssb.200541265
- C. Buchheim, R. Goldhahn, M. Rakel, C. Cobet, N. Esser, U. Rossow, D. Fuhrmann, and A. Hangleiter, Phys. Status Solidi B 0370-1972 10.1002/pssb.200541265 242, 2610 (2005).
- (2005) Phys. Status Solidi B , vol.242 , pp. 2610
- Buchheim, C.¹ Goldhahn, R.² Rakel, M.³ Cobet, C.⁴ Esser, N.⁵ Rossow, U.⁶ Fuhrmann, D.⁷ Hangleiter, A.⁸

34
- 0019539913
- 0040-6090 10.1016/0040-6090(82)90590-9
- D. E. Aspnes, Thin Solid Films 0040-6090 10.1016/0040-6090(82)90590-9 89, 249 (1982).
- (1982) Thin Solid Films , vol.89 , pp. 249
- Aspnes, D.E.¹

35
- 31644439486
- 0021-8979 10.1063/1.2161941
- J. Bai, T. Wang, P. Comming, P. J. Parbrook, J. P. R. David, and A. G. Cullis, J. Appl. Phys. 0021-8979 10.1063/1.2161941 99, 023513 (2006).
- (2006) J. Appl. Phys. , vol.99 , pp. 023513
- Bai, J.¹ Wang, T.² Comming, P.³ Parbrook, P.J.⁴ David, J.P.R.⁵ Cullis, A.G.⁶

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