Charge trapping properties of ultra-thin TiO2 films on strained-Si

Semiconductor Science and Technology

Volumn 22, Issue 7, 2007, Pages 774-783

  Bera, M K ^a   Maiti, C K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRAPPING; DIELECTRIC FILMS; HETEROJUNCTIONS; MIS DEVICES; THERMAL EFFECTS; TITANIUM DIOXIDE; VOLTAGE CONTROL;

ANNEALING TEMPERATURE; CONSTANT VOLTAGE STRESSING; MIS CAPACITORS;

ULTRATHIN FILMS;

EID: 34547319707     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/22/7/017     Document Type: Article

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