Ta2O5/SiO2 multilayered thin film on Si as a proposed new reference material for SIMS depth profiling

Surface and Interface Analysis

Volumn 26, Issue 1, 1998, Pages 9-16

  Kim, Kyung Joong ^a   Moon, Dae Won ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Depth profile; Reference material; SIMS; Thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFACES (MATERIALS); MULTILAYERS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SILICA; TANTALUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

DEPTH PROFILING; TANTALUM OXIDE;

THIN FILMS;

EID: 0031696283     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199801)26:1<9::AID-SIA341>3.0.CO;2-I     Document Type: Article

References (29)

1. K. Wittmaack, Vacuum 34, 119 (1984).
2. M. Moens, F. C. Adams and D. S. Simons, Anal. Chem. 59, 1518 (1987).
3. K. J. Kim and D. W. Moon, Appl. Phys. Lett. 60, 1178 (1992).
4. H. H. Andersen, Appl. Phys. 18, 131 (1979).
5. K. Wittmaack, in Practical Surface Analysis Volume II: Ion and Neutral Spectroscopy, edited by D. Briggs and M. P. Seah, Chapt. 3. Wiley, New York (1992).
6. C. P. Hunt and M. P. Seah, Surf. Interface Anal. 5, 199 (1983).
7. S. Hofmann and J. M. Sanz, Surf. Interface Anal. 6, 78 (1984).
8. M. P. Seah, H. J. Mathieu and C. P. Hunt, Surf. Sci. 139, 549 (1984).
9. J. Fine, B. Navinsek, F. Davarya and T. D. Andreadis, J. Vac. Sci. Technol. 20, 449 (1982).
10. J. Fine and B. Navinsek, J. Vac. Sci. Technol. A3, 1408 (1985).
11. K. Yoshihara, D. W. Moon, D. Fujita, K. J. Kim and K. Kajiwara, Surf. Interface Anal. 20, 1061 (1993).
12. K. Wittmaack, in Sputtering by Particle Bombardment II: Characteristics of Sputtered Panicles, Technical Applications, edited by R. Behrisch and K. Wittmaack, Chapt. 4. Springer-Verlag, Berlin (1991).
13. S. Hofmann, A. Zalar, E-H. Cirlin, J. J. Vajo, H. J. Mathieu and P. Panjan, Surf. Interface Anal. 20, 621 (1993).
14. J. Fine and B. Navinsek, Surf. Interface Anal. 23, 391 (1995).
15. K. S. Park, D. Y. Lee, K. J. Kim and D. W. Moon, Thin Solid Films 281-282, 419 (1996).
16. K. S. Park, D. Y. Lee, K. J. Kim and D. W. Moon, Appl. Phys. Lett. 70, 315 (1997).
17. J. B. Malherbe, S. Hofmann and J. M. Sanz, Appl. Surf. Sci. 27, 355 (1986).
18. K. J. Kim, D. W. Moon, S. H. Nam, W. J. Lee and H. K. Kim, Surf. Interface Anal. 23, 851 (1996).
19. E. Taglauer and W. Heiland, Appl. Phys. Lett. 33, 950 (1978).
20. S. Hofman and J. M. Sanz, J. Trace Microprobe Technol. 1, 213 (1982-1983).
21. D. W. Moon and K. J. Kim, Appl. Phys. Lett. 60, 3096 (1993).
22. K. Wittmaack, Nucl. Instrum. Methods 218, 307 (1983).
23. K. Wittmaack, J. Vac. Sci. Technol. A8, 2246 (1990).
24. D. W. Moon and K. J. Kim, J. Vac. Sci. Technol. A14, 2744 (1996).
25. J. C. Lee, C. S. Jeong, H. J. Kang, Y. P. Kim, H. K. Kim and D. W. Moon, J. Vac. Sci. Technol. A13, 1325 (1995).
26. I. Kojima, B. Li, T. Fujimoto, K. J. Kim and D. W. Moon, J. Phys. D30, 2143 (1997).
27. G. H. Morrison, K. C. Cheng and M. Grasserbauer, Pure Appl. Chem. 51, 2243 (1979).
28. S. Hofmann, Surf. Interface Anal. 2, 148 (1980).
29. S. Hofmann, in Practical Surface Analysis Volume I: Auger and X-ray Photoelectron Spectroscopy, edited by D. Briggs and M. P. Seah, Chapt. 4. Wiley, New York (1990).