High-performance and damage-free neutral-beam etching processes using negative ions in pulse-time-modulated plasma

Applied Surface Science

Volumn 253, Issue 16, 2007, Pages 6681-6689

  Samukawa, Seiji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Neutral beam; Plasma etching; ULSI

Indexed keywords

LSI CIRCUITS; NEGATIVE IONS; PHOTONS; PLASMA APPLICATIONS;

DAMAGE FREE ETCHING; NEUTRAL BEAM; ULTRALARGE-SCALE INTEGRATED (ULSI) DEVICES;

PLASMA ETCHING;

EID: 34248366993     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.003     Document Type: Article

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