Irradiation damage in SiO 2/Si system induced by photons and/or ions in photo-oxidation and plasma-oxidation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 12, 2004, Pages 8002-8006

  Okamoto, Tetsuya ^a,b   Ide, Tetsuya ^a   Sasaki, Atsushi ^a   Azuma, Kazufumi ^a   Nakata, Yukihiko ^a,c  

^a Advanced LCD Technologies Development Center Co Ltd   (Japan)

^b SHARP CORPORATION   (Japan)

^c RITSUMEIKAN ASIA PACIFIC UNIVERSITY   (Japan)

Author keywords

Ion damage; Irradiation damage; Photo oxidation; Photo oxide; Photon damage; SiO 2; Surface wave plasma; Thin film transistor; Xe excimer lamp

Indexed keywords

ION DAMAGE; IRRADIATION DAMAGE; PHOTO-OXIDE; PHOTON DAMAGE; SURFACE WAVE PLASMA; XE EXCIMER LAMP;

IRRADIATION; KRYPTON; MICROWAVES; PHOTONS; PHOTOOXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE WAVES; THIN FILM TRANSISTORS;

SILICA;

EID: 13644281529     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.8002     Document Type: Article

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