Enhancement of reactivity in Au etching by pulse-time-modulated Cl2 plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2311-2313

  Ohtake, Hiroto ^a   Samukawa, Seiji ^a   Oikawa, Hirokazu ^a   Nashimoto, Yasunobu ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Aluminum; Chlorine; ECR; Gold; Negative ion; Plasma etching; Pulse time modulation

Indexed keywords

ALUMINUM; CHLORINE; ELECTRON CYCLOTRON RESONANCE; EVAPORATION; GOLD; IONS; PLATINUM; PULSE TIME MODULATION;

PULSE TIME MODULATED PLASMAS;

PLASMA ETCHING;

EID: 0032051297     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2311     Document Type: Article

References (6)

1. K. Nishikawa, Y. Kusumi, T. Oomori, M. Hanazaki and K. Namba: Jpn. J. Appl. Phys. 32 (1993) 6102.
2. W. J. Yoo, J. H Hahm, H. W. Kim, C. O. Jung, Y. B. Koh and M. Y. Lee: Jpn. J. Appl. Phys. 35 (1996) 2501.
3. S. Samukawa: Appl. Phys. Lett. 64 (1994) 3398.
4. S. Samukawa, H. Ohtake and T. Mieno: J. Vac. Sci. Technol. A 14 (1996) 3049.
5. S. Samukawa and S. Furuoya: Appl. Phys. Lett. 63 (1993) 2044.
6. A. Yokozawa, H. Ohtake and S. Samukawa: Jpn. J. Appl. Phys. 35 (1996) 2433.