Absolute intensities of the vacuum ultraviolet spectra in a metal-etch plasma processing discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3209-3217

  Woodworth, J R ^a   Blain, M G ^a   Jarecki, R L ^a   Hamilton, T W ^a   Aragon, B P ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033413515     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582044     Document Type: Article

References (45)

1. G. S. Oehrlein, Mater. Sci. Eng., B 4, 441 (1989).
2. K. H. Ryden, H. Norstrom, C. Nender, and S. Berg, J. Electrochem. Soc. 134, 3113 (1987).
3. A. W. Flounders, S. A. Bell, and D. W. Hess, J. Electrochem. Soc. 140, 1414 (1993).
4. P. A. Miller, D. M. Fleetwood, and W. K. Schubert, J. Appl. Phys. 69, 488 (1991).
5. T. Tatsumi, S. Fukuda, and S. Kadomura, Jpn. J. Appl. Phys., Part 1 32, 6114 (1993).
6. C. Cardinaud, G. Turban, B. Grolleau, J. P. Grandchamp, C. Lejeune, P. Scheiblin, and E. Collard, Appl. Surf. Sci. 36, 332 (1989).
7. S. Yokoyama, Z. J. Radzimski, K. Ishibashi, S. Miyazaki, and M. Hirose, Jpn. J. Appl. Phys., Part 1 33, 2179 (1994).
8. K. Yokogawa, Y. Yajima, and T. Mizutani, Jpn. J. Appl. Phys., Part 1 30, 3199 (1991).
9. T. Yunogami and T. Mizutani, J. Appl. Phys. 73, 8184 (1993).
10. T. Ono, N. Itabashi, I. Ochiai, S. Yamamoto, and K. Mochiji, Jpn. J. Appl. Phys., Part 1 36, 6718 (1997).
11. T. Mizutani, S. Nishimatsu, and T. Yunogami, Mater. Res. Soc. Symp. Proc. 128, 605 (1989).
12. T. Kang, S. Ueng, B. Dai, L. Chen, and H. Cheng, Jpn. J. Appl. Phys., Part 1 34, 2272 (1995).
13. T. Yunogami, T. Mizutani, K. Tsujimoto, and K. Suzuki, Jpn. J. Appl. Phys., Part 1 29, 2269 (1990).
14. K. Yokogawa, Y. Yajima, T. Mizutani, S. Nishimatsu, and K. Suzuki, Jpn. J. Appl. Phys., Part 1 29, 2265 (1990).
15. T. Yunogami, T. Mizutani, K. Suzuki, and S. Nishimatsu, Jpn. J. Appl. Phys., Part 1 28, 2172 (1989).
16. T. Tatsumi, S. Fukuda, and S. Kadomura, Jpn. J. Appl. Phys., Part 1 33, 2175 (1994).
17. C. M. Dozier and D. B. Brown, IEEE Trans. Nucl. Sci. NS-28, 4137 (1981).
18. C. M. Dozier, D. B. Brown, R. K. Freitag, and J. L. Throckmorton, IEEE Trans. Nucl. Sci. NS-33, 1324 (1986).
19. S. Fang and J. P. McVittie, J. Appl. Phys. 72, 4865 (1992).
20. S. Fang and J. P. McVittie, Appl. Phys. Lett. 62, 1507 (1993).
21. S. Murakawa and J. P. McVittie, Jpn. J. Appl. Phys., Part 1 33, 2184 (1994).
22. S. Ma, M. Jain, and J. D. Chinn, J. Vac. Sci. Technol. A 16, 1440 (1998).
23. D. L. Griscom and W. B. Fowler, Proceedings of the International Topical Conference on MOS Insulators, Raleigh, NC (Pergamon Press, New York, 1980), p. 97.
24. A. C. Fozza, A. Kruse, A. Hollander, A. Ricard, and M. R. Wertheimer, J. Vac. Sci. Technol. A 16, 72 (1998).
25. S. Miyake, W. Chen, and T. Ariyasu, Jpn. J. Appl. Phys., Part 1 29, 2491 (1990).
26. J. R. Woodworth (unpublished).
27. K. Krisnan, B. Hallet, J. Schnell, T. R. Webb, J. Shiau, P. K. Loewenhardt, and D. X. Ma, Tech. Dig. Int. Electron Devices Meet. 315 (1995).
28. Galileo Electro-Optics Corp. Sturbridge, MA.
29. R. E. Vest, National Institute of Standards and Technology, Gaithersburg, MD; electronic mail: rvest@nist.gov
30. J. R. Woodworth, Ph.D. Thesis, Dept. of Physics, The Johns Hopkins University, 1974. Available from University Microfilms, Ann Arbor, MI.
31. J. R. Woodworth, M. E. Riley, R. A. Miller, C. A. Nichols, and T. W. Hamilton, J. Vac. Sci. Technol. A 15, 3015 (1997).
32. T. Holstein, Phys. Rev. 72, 1212 (1947).
33. J. Huennekens and T. Colbert, J. Quant. Spectrosc. Radiat. Transf. 41, 439 (1989).
34. T. Holstein, Phys. Rev. 83, 1159 (1951).
35. M. E. Riley and W. J. Alford, Radiation Trapping in Plasmas, Sandia Report SAND95-1201. UC-401, June 1995.
36. R. M. Forrister and H. M. Anderson, Bull. Am. Phys. Soc. 40, 1556 (1995).
37. W. L. Wiese, M. W. Smith, and B. M. Miles, Atomic Transition Probabilities, Vol. 2, National Bureau of Standards, NSRDS-NBS 22, October, 1969.
38. A. C. G. Mitchell and M. W. Zemansky, Resonance Radiation and Excited Atoms (Cambridge University Press, Cambridge, 1934).
39. G. A. Hebner and P. A. Miller, J. Vac. Sci. Technol. A (submitted).
40. H. R. Philip, in Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, New York, 1985), p. 749.
41. B. E. Deal, IEEE Trans. Electron Devices ED-27, 606 (1980).
42. A. M. Goodman, Phys. Rev. 144, 588 (1966).
43. R. Williams, Phys. Rev. 140, A569 (1965).
44. E. Kooi, Philips Res. Rep. 20, 595 (1965).
45. S. M. Sze, Physics of Semiconductor Devices (Wiley, New York, 1995).