Quantitative nanoscale local strain profiling in embedded SiGe metal-oxide-semiconductor structures

Applied Physics Letters

Volumn 90, Issue 19, 2007, Pages

  Zhao, W ^a   Duscher, G ^a   Rozgonyi, G ^a   Zikry, M A ^a   Chopra, S ^a   Ozturk, M C ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON DIFFRACTION; FINITE ELEMENT METHOD; SILICON COMPOUNDS; STRAIN MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

CONVERGENT BEAM ELECTRON DIFFRACTION (CBED); LOCAL STRAIN PROFILING; LONGITUDINAL STRAIN; STRAIN ENGINEERING;

MOSFET DEVICES;

EID: 34248361149     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2738188     Document Type: Article

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