|
Volumn 99, Issue 6, 2006, Pages
|
Convergent beam electron diffraction investigation of strain induced by Ti self-aligned silicides in shallow trench Si isolation structures
|
Author keywords
[No Author keywords available]
|
Indexed keywords
COMPUTER SIMULATION;
DEFORMATION;
RELAXATION PROCESSES;
SILICON;
STRAIN;
STRAIN RATE;
TITANIUM COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
CONVERGENT BEAM ELECTRON DIFFRACTION TECHNIQUE (CBED);
HIGH ORDER LAUE ZONE (HOLZ);
TI SELF-ALIGNED SILICIDES;
ELECTRON DIFFRACTION;
|
EID: 33645665183
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2179136 Document Type: Article |
Times cited : (15)
|
References (12)
|