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Volumn 47, Issue 6, 2007, Pages 880-889

Negative bias temperature instabilities in HfSiO(N)-based MOSFETs: Electrical characterization and modeling

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; GATE DIELECTRICS; MATHEMATICAL MODELS; PROTON TRANSFER; SURFACE DEFECTS; THERMODYNAMIC STABILITY;

EID: 34247868948     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2006.10.010     Document Type: Article
Times cited : (5)

References (45)
  • 2
    • 3042715207 scopus 로고    scopus 로고
    • For a recent review, see. Houssa M. (Ed), IOP, London
    • For a recent review, see. In: Houssa M. (Ed). High-κ gate dielectrics (2004), IOP, London
    • (2004) High-κ gate dielectrics
  • 42


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.