Reaction-dispersive proton transport model for negative bias temperature instabilities

Applied Physics Letters

Volumn 86, Issue 9, 2005, Pages 1-3

  Houssa, M ^a   Aoulaiche, M ^a   De Gendt, S ^a   Groeseneken, G ^a   Heyns, M M ^a   Stesmans, A ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; DIFFUSION; DISPERSIONS; ELECTRIC FIELD EFFECTS; ELECTROCHEMISTRY; PROTONS; REACTION KINETICS; SILICA; TRANSPORT PROPERTIES;

ELECTROCHEMICAL REACTION; GATE VOLTAGE; PROTON TRANSPORT PROCESSES; TEMPERATURE INSTABILITIES;

MOSFET DEVICES;

EID: 17044380280     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1871357     Document Type: Article

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