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Journal of Materials Chemistry

Volumn 17, Issue 17, 2007, Pages 1699-1706

Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography

(5) Wang, Mingxing a Gonsalves, Kenneth E a Rabinovich, Monica a Yueh, Wang b Roberts, Jeanette M b

a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

b INTEL CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE; OPTICAL RESOLVING POWER; POLYMER BLENDS; THERMODYNAMIC STABILITY;

PAG BLEND POLYMERS; PHOTOACID GENERATORS (PAGS); POLYMER RESIST;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 34247326530 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b617133h Document Type: Article

Times cited : (48)

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