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Journal of Materials Chemistry

Volumn 16, Issue 37, 2006, Pages 3701-3707

Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography

(7) Wang, Mingxing a Jarnagin, Nathan D a Lee, Cheng Tsung b Henderson, Clifford L b Yueh, Wang c Roberts, Jeanette M c Gonsalves, Kenneth E a

a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

b Georgia Institute of Technology (United States)

c INTEL CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN GASES; ETCHING; PHOTOLITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

BLEND RESISTS; ETCH RESISTANCE; PHOTORESIST MATERIALS; POLYMERIC ANIONIC PHOTOACID GENERATORS (PAGS);

GAS GENERATORS;

EID: 33748780067 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b607918k Document Type: Article

Times cited : (50)

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