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Volumn 16, Issue 3, 2003, Pages 447-450
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Progress in resists development for EPL (Electron Beam Projection Lithography)
a
a
JSR CORPORATION
(Japan)
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Author keywords
EPL; Line edge roughness; Resist; Resolution; Sensitivity
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Indexed keywords
ACID;
RESIN;
ARTICLE;
DEVICE;
DIFFUSION;
ELECTRON BEAM PROJECTION LITHOGRAPHY;
GEL PERMEATION CHROMATOGRAPHY;
LOW ENERGY ELECTRON PROXIMITY LITHOGRAPHY;
MOLECULAR WEIGHT;
PHYSICAL PARAMETERS;
PROCESS TECHNOLOGY;
ULTRAVIOLET RADIATION;
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EID: 0038506968
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.16.447 Document Type: Article |
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Times cited : (2)
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References (10)
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