메뉴 건너뛰기




Volumn 27, Issue 18, 2006, Pages 1590-1595

Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers

Author keywords

Anionic PAG; Calorimetry; EUV lithography; Photoacid generator (PAG); Polymer resist

Indexed keywords

ANIONIC PAG; EUV LITHOGRAPHYEUV LITHOGRAPHY; PHOTOACID GENERATORS (PAG); POLYMER RESISTS;

EID: 33749564137     PISSN: 10221336     EISSN: 15213927     Source Type: Journal    
DOI: 10.1002/marc.200600330     Document Type: Article
Times cited : (27)

References (16)
  • 1
    • 31644439044 scopus 로고    scopus 로고
    • International technology roadmap for semiconductors (ITRS)
    • International Technology Roadmap for Semiconductors (ITRS) 2005, Lithography, http://public.itrs.net/.
    • (2005) Lithography
  • 11
    • 33749578610 scopus 로고    scopus 로고
    • EP 1083167 A1
    • EP 1083167 A1 (2001), invs.: H. R. Thomas.
    • (2001)
    • Thomas, H.R.1
  • 16
    • 33749570786 scopus 로고    scopus 로고
    • Private communication from Professor C. L. Henderson and C. Lee at Georgia Institute of Technology
    • Private communication from Professor C. L. Henderson and C. Lee at Georgia Institute of Technology.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.