Mode transitions and hysteresis in inductively coupled plasmas

Journal of Applied Physics

Volumn 101, Issue 7, 2007, Pages

  Daltrini, A M ^a   Moshkalev, S A ^a   Monteiro, M J R ^a   Besseler, E ^a   Kostryukov, A ^b   Machida, M ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY ANALYZERS; HYSTERESIS; METASTABLE PHASES; OPTICAL EMISSION SPECTROSCOPY; PARAMETER ESTIMATION; PLASMA DIAGNOSTICS;

ELECTRON ENERGY DISTRIBUTION; MODE TRANSITIONS; PLASMA PARAMETERS;

INDUCTIVELY COUPLED PLASMA;

EID: 34247267711     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2715845     Document Type: Article

References (24)

1. T. Brückl and H. Zull, J. Appl. Phys. 98, 023307 (2005).
2. H. Seo, J.-H. Kim, K.-H. Chung, J. Y. Kim, S. H. Kim, and H. Jeon, J. Appl. Phys. 98, 043308 (2005).
3. F. Pommereau, L. Legouézigou, S. Hubert, S. Sainson, J.-P. Chandouineau, S. Fabre, and G.-H. Duan, J. Appl. Phys. 95, 2242 (2004).
4. I. B. Denysenko, S. Xu, J. D. Long, P. P. Rutkevych, N. A. Azarenkov, and K. Ostrikov, J. Appl. Phys. 95, 2713 (2004).
5. D. Y. Choi, J. H. Lee, D. S. Kim, and S. T. Jung, J. Appl. Phys. 95, 8400 (2004).
6. T. Czerwiec and D. B. Graves, J. Phys. D 37, 2827 (2004).
7. K. N. Ostrikov, S. Xu, and M. Y. Yu, J. Appl. Phys. 88, 2268 (2000).
8. U. Kortshagen, N. D. Gibson, and J. E. Lawler, J. Phys. D 29, 1224 (1996).
9. M. M. Turner and M. A. Lieberman, Plasma Sources Sci. Technol. 8, 313 (1999).
10. G. Cunge, B. Crowley, D. Vender, and M. M. Turner, Plasma Sources Sci. Technol. 8, 576 (1999).
11. V. I. Demidov, C. A. DeJoseph, Jr., and A. A. Kudryavtsev, Plasma Sources Sci. Technol. 13, 600 (2004).
12. M. Edamura and E. C. Benck, J. Vac. Sci. Technol. A 21, 470 (2003).
13. T. Sato and T. Makabe, J. Appl. Phys. 98, 113304 (2005).
14. N. C. M. Fuller, M. V. Malyshev, V. M. Donnelly, and I. P. Herman, Plasma Sources Sci. Technol. 9, 116 (2000).
15. G. A. Hebner and C. B. Fleddermann, J. Appl. Phys. 82, 2814 (1997).
16. S. Xu, K. N. Ostrikov, W. Luo, and S. Lee, J. Vac. Sci. Technol. A 18, 2185 (2000).
17. J. Amorin, H. S. Maciel, and J. P. Sudano, J. Vac. Sci. Technol. B 9, 362 (1991).
18. V. M. Donnelly, J. Phys. D 37, R217 (2004).
19. J. B. Boffard, C. C. Lin, and C. A. DeJoseph, Jr., J. Phys. D 37, R143 (2004).
20. S. A. Moshkalyov, P. G. Steen, S. Gomez, and W. G. Graham, Appl. Phys. Lett. 75, 328 (1999).
21. T. Kitajima, T. Nakano, and T. Makabe, Appl. Phys. Lett. 88, 091501 (2006).
22. M.-H. Lee and C.-W. Chung, Appl. Phys. Lett. 87, 131502 (2005).
23. M. W. Kiehlbauch and D. B. Graves, J. Appl. Phys. 91, 3539 (2002).
24. A. M. Daltrini, S. A. Moshkalev, T. J. Morgan, and W. G. Graham, Proceedings of the 59th Gaseous Electronics Conference, Columbus, 10 October 2006 (unpublished).