Formation of plasma induced surface damage in silica glass etching for optical waveguides

Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 8400-8407

  Choi, D Y ^a,b   Lee, J H ^a   Kim, D S ^a   Jung, S T ^a  

^a SAMSUNG Electronics   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLOTRON RESONANCE; DOPING (ADDITIVES); ETCHING; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PHOTORESISTORS; PLASMAS; POLYMERS; SURFACE ROUGHNESS; THIN FILMS; WAVEGUIDES;

INDUCTIVELY COUPLED PLASMAS (ICP); OPTICAL BIOSENSING; PLANAR LIGHTWAVE CIRCUITS (PLC); PLASMA-INDUCED SURFACE DAMAGE (PISD);

FUSED SILICA;

EID: 3142647684     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1739525     Document Type: Article

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