Transition from E to H mode discharge in pulse-modulated inductively coupled plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 2, 2003, Pages 470-475

  Edamura, Manabu ^a,b   Benck, Eric C ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC IMPEDANCE; ELECTRODES; FREQUENCIES; PLASMA ETCHING; PULSE MODULATION; THERMAL EFFECTS;

PLASMA PROCESSING APPARATUS;

INDUCTIVELY COUPLED PLASMA;

EID: 0037348172     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1545756     Document Type: Article

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