Characterization of remote inductively coupled CH 4 - N 2 plasma for carbon nitride thin-film deposition

Journal of Applied Physics

Volumn 98, Issue 4, 2005, Pages

  Seo, Hyungtak ^a   Kim, Jung Hyung ^b   Chung, Kwang Hwa ^b   Kim, Ju Youn ^c   Kim, Seok Hoon ^c   Jeon, Hyeongtag ^c  

^a North Carolina State University   (United States)

^b Korea Research Institute of Standards and Science   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY (AES); HYBRID BONDING; OPTICAL EMISSION SPECTROSCOPY (OES); REACTION CHARACTERISTICS;

AMORPHOUS MATERIALS; BONDING; CARBON NITRIDE; CARRIER CONCENTRATION; DIFFUSION; ELECTRON SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA;

THIN FILMS;

EID: 25144513938     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2032617     Document Type: Article

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