Characteristics of pulsed plasma doping sources for ultrashallow junction formation

Journal of Applied Physics

Volumn 101, Issue 6, 2007, Pages

  Agarwal, Ankur ^a   Kushner, Mark J ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b Iowa State University of Science and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA DOPING; PULSED PLASMA DOPING SOURCES; QUASICONTINUOUS PLASMAS; ULTRASHALLOW JUNCTION FORMATION;

COMPUTATIONAL METHODS; CURRENT DENSITY; DOPING (ADDITIVES); ION IMPLANTATION; SEMICONDUCTOR DEVICES; THROUGHPUT;

PLASMA SOURCES;

EID: 34047150366     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2433746     Document Type: Article

References (72)

1. International Technology Roadmap for Semiconductors-Semiconductor Industry Association (http://public.itrs.net/Files/2003ITRS/Home2003.htm), 2003.
2. Q. L. Zhang, C. Tang, T. Hsieh, N. Maccrae, B. Singh, K. Poolla and C. J. Spanos, Proc. SPIE 5372, 692 (2005).
3. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
4. S. Walther and R. Liebert, J. Vac. Sci. Technol. B 24, 482 (2006).
5. D. A. Brown and J. F. O'Hanlon, Phys. Rev. E 48, 523 (1996).
6. A. Renau and J. T. Scheuer, Proceedings of the 14th International Conference on Ion Implant Tech (IEEE, New York, 2002), p. 151.
7. G. Angel, E. Bell, D. Brown, J. Buff, J. Cummings, W. Edwards, C. McKenna, S. Radovanov, and N. R. White, Proceedings of the 12th International Conference on Ion Implant Tech (IEEE, New York, 1998), p. 188.
8. H. Sundstrom, V. Benveniste, M. Graf, W. Krull, F. Sinclair, and T. Kinney, Proceedings of the 12th International Conference on Ion Implant Tech (IEEE, New York, 1998). p. 184.
9. P. Edwards et al., Proceedings of the, 12th International Conference on Ion Implant Tech (IEEE, New York, 1998), p. 362.
10. J. A. van den Berg, G. Wostenholm, M. Geryk, and D. G. Armour, Proceedings of the 13th International Conference on Ion Implant Tech (IEEE, New York, 2000), p. 627.
11. P. K. Chu, S. Qin, C. Chan, N. W. Cheung, and L. A. Larson, Mater. Sci. Eng., R. 17, 207 (1996).
12. S. B. Felch, Z. Fang, B.-W. Koo, R. B. Liebert, S. R. Walther, and D. Hacker, Surf. Coat. Technol. 156, 229 (2002).
13. R. J. Matyi, D. L. Chapek, D. P. Brunco, S. B. Felch, and B. S. Lee, Surf. Coat. Technol. 93, 247 (1997).
14. S. B. Felch, B. S. Lee, S. L. Daryanani, D. F. Downey, and R. J. Matyi, Mater. Chem. Phys. 54, 37 (1998).
15. M. J. Goeckner, S. B. Felch, Z. Fang, D. Lenoble, J. Galvier, A. Grouillet, G. C.-F. Yeap, D. Bang, and M.-R. Lin, J. Vac. Sci. Technol. A 17, 2290 (1999).
16. J. T. Scheuer et al., Surf. Coat. Technol. 186, 57 (2004).
17. D. Vempaire, J. Pelletier, A. Lacoste, S. Béchu, J. Sirou, S. Miraglia, and D. Frachart, Plasma Phys. Controlled Fusion 47, A153 (2005).
18. A. Agarwal and M. J. Kushner, IEEE Trans. Plasma Sci. 33, 252 (2005).
19. R. L. Kinder and M. J. Kushner, J. Appl. Phys. 90, 3699 (2001).
20. R. L. Kinder and M. J. Kushner, J. Vac. Sci. Technol. A 19, 76 (2001).
21. A. V. Phelps and Z. L. Petrović, Plasma Sources Sci. Technol. 8, R21 (1999).
22. Y. Chutopa, B. Yotsombat, and I. G. Brown, IEEE Trans. Plasma Sci. 31, 1095 (2003).
23. K. Ohya, Nucl. Instrum. Methods Phys. Res. B 153, 58 (1999).
24. K. Ohya, Nucl. Instrum. Methods Phys. Res. B 206, 52 (2003).
25. M. M. Shamim, J. T. Scheuer, R. P. Fetherston, and J. R. Conrad, J. Appl. Phys. 70, 4756 (1991).
26. W. En and N. W. Cheung, IEEE Trans. Plasma Sci. 24, 1184 (1996).
27. M. Hayashi, Nagoya Institute of Technology Report No. IPPJ-AM-19 (Research Information Center, IPP/Nagoya University, Nagoya, Japan, 1981).
28. K. Tachibana, Phys. Rev. A 34, 1007 (1986).
29. D. Rapp and P. Englander-Golden, J. Chem. Phys. 43, 1464 (1965).
30. R. H. McFarland and J. D. Kinney, Phys. Rev. 137, 1058 (1965).
31. T. N. Rescigno, Phys. Rev. A 52, 329 (1995).
32. E. Meeks, R. S. Larson, S. R. Vosen, and J. W. Shon, J. Electrochem. Soc. 144, 357 (1997); E. Meeks (private communication).
33. S. Ushiroda, S. Kajita, and Y. Kondo, J. Phys. D 23, 47 (1990).
34. V. Tarnovsky, A. Levin, K. Becker, R. Basner, and M. Schmidt, Int. J. Mass Spectrom. Ion Process. 133, 175 (1994).
35. K. E. Greenberg and J. T. Verdeyen, J. Appl. Phys. 57, 1596 (1985).
36. M. Hayashi and T. Nimura, J. Appl. Phys. 54, 4879 (1983).
37. W. L. Morgan, Adv. At., Mol., Opt. Phys. 43, 79 (2000).
38. T. R. Hayes, R. C. Wetzel, and R. S. Freund, Phys. Rev. A 35, 578 (1987).
39. A. V. Phelps and L. C. Pitchford, Phys. Rev. A 31, 2932 (1985).
40. D. C. Cartwright, S. Trajmar, A. Chutjian, and W. Williams, Phys. Rev. A 16, 1041 (1977).
41. W. L. Borst, Phys. Rev. A 5, 648 (1972).
42. R. T. Brinkmann and S. Trajmar, Ann. Geophys. (C.N.R.S.) 26, 201 (1970).
43. L. Vriens, Phys. Lett. 8, 260 (1964).
44. A. V. Phelps, J. Phys. Chem. Ref. Data 20, 557 (1991).
45. S. Geltman, J. Quant. Spectrosc. Radiat. Transf. 13, 601 (1973).
46. R. J. W. Henry, P. G. Burke, and A.-L. Sinfailam, Phys. Rev. 178, 218 (1969).
47. A. C. H. Smith, E. Caplinger, R. H. Neynaber, E. W. Rothe, and S. M. Trujillo, Phys. Rev. 127, 1647 (1962).
48. A. N. Klucharev and V. Vujnovic, Phys. Rep. 185, 55 (1990).
49. L. G. Piper, J. E. Velazco, and D. W. Setser, J. Chem. Phys. 59, 3323 (1973).
50. J. E. Velazco, J. H. Kolts, and D. W. Setser, J. Chem. Phys. 65, 3468 (1976).
51. R. J. Shul, R. Passarella, B. L. Upschulte, R. G. Keesee, and A. W. Castleman, Jr., J. Chem. Phys. 86, 4446 (1987).
52. T. M. Miller, J. F. Friedman, A. E. S. Miller, and J. F. Paulson, J. Phys. Chem. 98, 6144 (1994).
53. G. I. Font, W. L. Morgan, and G. Mennenga, J. Appl. Phys. 91, 3530 (2002).
54. 54M. Hamdan, N. W. Copp, K. Birkinshaw, J. D. C. Jones, and N. D. Twiddy, Int. J. Mass Spectrom. Ion Process. 69, 191 (1986).
55. D. Smith, N. G. Adams, and T. M. Miller, J. Chem. Phys. 69, 308 (1978).
56. E. E. Ferguson, Adv. Electron. Electron Phys. 24, l (1968).
57. S. A. Sullivan and J. L. Beauchamp, Inorg. Chem. 17, 1589 (1978).
58. P. B. Armentrout, D. W. Berman, and J. L. Beauchamp, Chem. Phys. Lett. 53, 255 (1978).
59. R. E. Olson, J. R. Peterson, and J. Moseley, J. Chem. Phys. 53, 3391 (1970).
60. A. C. Lloyd, Int. J. Chem. Kinet. 3, 39 (1971).
61. J. B. Koffend, C. E. Gardner, and R. F. Heidner, J. Chem. Phys. 83, 2904 (1985).
62. V. N. Kondratiev, Rate Constants of Gas Phase Reactions (COM-72-10014) (U.S. Department of Commerce, Washington, DC, 1972).
63. B. H. Weiller, R. F. Heidner, J. S. Holloway, and J. B. Koffend, J. Phys. Chem. 96, 9321 (1992).
64. C. T. Cheah, M. A. A. Clyne, and P. D. Whitefield, J. Chem. Soc., Faraday Trans. 2 76, 711 (1980).
65. V. B. Rozenshtein, Y. R. Bedzhanyan, and Y. M. Gershenson, Kinet. Catal. 29, 22 (1988).
66. M. F. Golde, Int. J. Chem. Kinet. 20, 75 (1988).
67. L. G. Piper, J. Chem. Phys. 87, 1625 (1987).
68. J. C. Person and D. O. Harn, Radiat. Phys. Chem. 31, l (1988).
69. J. A. Kerr and S. J. Moss, CRC Handbook of Biomolecular and Trimolecular Gas Reactions (CRC, Boca Raton, FL, 1981). 70 L. G. Piper, J. Chem. Phys. 88, 231 (1988).
70. Y. Ikezoe, S. Matsuoka, M. Takebe, and A. Viggiano, Gas Phase Ion Molecule Reaction Rate Constants Through 1986 (Ion Reaction Research Group, Tokyo, Japan, 1987).
71. J. A. Stittsworth and A. E. Wendt, Plasma Sources Sci. Technol. 5, 429 (1996).
72. W. Ensinger, Mater. Sci. Eng., A 253, 258 (1998).