Novel beam line for sub-keV implants with reduced energy contamination

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 188-191

  Angel, Gordon ^a   Bell, Edward ^a   Brown, Douglas ^a   Buff, James ^a   Cummings, James ^a   Edwards, William ^a   McKenna, Charles ^a   Radovanov, Svetlana ^a   White, Nicholas R ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ION BEAMS; MAGNETS;

HIGH CURRENT ION IMPLANTATION SYSTEMS;

ION IMPLANTATION;

EID: 0033312486     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)