Charge exchange cross sections relevant to ion implantation for ultra shallow junctions

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 627-630

  Van Den Berg, Jaap A ^a   Wostenholm, George ^a   Geryk, Michal ^a   Armour, David G ^a   Cook, Charlie E A ^b   Murrell, Adrian J ^b  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b Ion Implant Division   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ASYMMETRIC CROSS SECTION; BACKGROUND GAS; BEAM IONS; BEAM LINES; BEAM TRANSPORT; CHARGE EXCHANGE PROCESS; CHARGE EXCHANGES; CHARGE-EXCHANGE CROSS SECTIONS; CROSS SECTION; ENERGY DEPENDENCE; ENERGY RANGES; GROWTH CURVES; ION ENERGIES; ION IMPLANTERS; LOW ENERGIES; MASS ANALYSIS; MEASUREMENT PROCEDURES; OPTIMUM CONDITIONS; ULTRA LOW ENERGY; ULTRA SHALLOW JUNCTION;

ARGON; CHARGE TRANSFER; ION IMPLANTATION; PLASMAS; XENON;

ION EXCHANGE;

EID: 78649884745     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924231     Document Type: Conference Paper

References (4)

1. K Leyland, "The measurement of charge transfer cross sections of interest in accelerator technology," PhD thesis, University of Salford, 1977.
2. K Leyland, D G Armour, G Carter and J 11 Freeman, "Charge transfer cross sections in high-flux, low energy accelerators," Inst. Phys. Con). Ser., no 38, pp 175, 1977.
3. H Kheyrandish and D G Armour, "The measurement of charge transfer cross sections for a variety of ions on air and argon," Vacuum, vol. 34, no. 1 and 2, pp. 269-273, 1984.
4. R D Goldberg, D G Armour, J A van den Berg, N Knorr, H Ohno, S Whelan, S Zhang, C E A Cook, and M A Foad. "The production and use of ultra-low energy ion beams," Rev. Sci. Instr. vol. 71 (2), pp. 1032-1035, 2000.