Thermal stability of Er2O3 thin films grown epitaxially on Si substrates

Journal of Applied Physics

Volumn 101, Issue 6, 2007, Pages

  Chen, Sheng ^a   Zhu, Yanyan ^a   Wu, Rong ^a   Wu, Yueqin ^a   Fan, Yongliang ^a   Jiang, Zuimin ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; ERBIUM COMPOUNDS; FILM GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LATTICE MISMATCH; SEMICONDUCTING SILICON; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

EPITAXIAL THIN FILM GROWTH; SILICATE FORMATION; SILICON SUBSTRATES;

THIN FILMS;

EID: 34047100278     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2712144     Document Type: Article

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