Thermal stability of Pr2O3 films grown on Si(100) substrate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1860-1866

  Goryachko, A ^a,b   Liu, J P ^a   Kruger D ^a   Osten, H J ^a   Bugiel, E ^a   Kurps, R ^a   Melnik, V ^a,c  

^a IHP   (Germany)

^b TARAS SHEVCHENKO NATIONAL UNIVERSITY OF KYIV   (Ukraine)

^c INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DIFFUSION; MIXTURES; OXIDATION; PRASEODYMIUM COMPOUNDS; SILICA; SILICON; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

UNCAPPED FILMS;

METALLIC FILMS;

EID: 0036865362     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1507332     Document Type: Article

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