Chemical mechanical planarization of copper using abrasive-free solutions of oxalic acid and hydrogen peroxide

Materials Chemistry and Physics

Volumn 102, Issue 2-3, 2007, Pages 144-151

  Pandija, S ^a   Roy, D ^a   Babu, S V ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

CMP; Copper; Oxalic Acid; Semiconductor devices; Surface composition

Indexed keywords

ACIDITY; CHEMICAL MECHANICAL POLISHING; DISSOLUTION; HYDROGEN PEROXIDE; SLURRIES; SURFACE PROPERTIES; WEAR RESISTANCE;

ABRASIVE-FREE SOLUTIONS; COLLOIDAL SILICA; ELECTROCHEMICAL EXPERIMENTS;

COPPER;

EID: 33847617437     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2006.11.015     Document Type: Article

References (45)

1. In: Babu S.V., Cadien K.C., and Yano H. (Eds). Chemical-Mechanical Polishing 2001: Advances and Future Challenges (2001), Materials Research Society, Warrendale
2. Zantye P.B., Kumar A., and Sikdar A.K. Mater. Sci. Eng. R45 (2004) 89-220
3. Singh R.K., and Bajaj R. Mater. Res. Soc. Bull. 27 (2002) 743
4. Aksu S., Wang L., and Doyle F.M. J. Electrochem. Soc. 150 (2003) G718
5. Zhuang Y., Li Z.L., Shimazu Y., Uotani N., Borucki L., and Philipossian A. Jpn. J. Appl. Phys. Part 1 44 (2005) 82
6. Lu Z., Lee S.H., Babu S.V., and Matijević E. J. Colloid. Interface Sci. 261 (2003) 55
7. Lee S.H., Lu Z.Y., Babu S.V., and Matijević E. J. Mater. Res. 17 (2002) 2744
8. Assiongbon K.A., Emery S.B., Gorantla V.R.K., Babu S.V., and Roy D. Corros. Sci. 48 (2006) 372
9. Nguyen V.H., Hof A.J., van Kranenburg H., Woerlee P.H., and Weimar F. Microelectron. Eng. 55 (2001) 305
10. van der Velden P. Microelectron. Eng. 50 (2000) 41
11. Amanokura J., Kamigata Y., Habiro M., Suzuki H., and Hanazono M. Proc. Mater. Res. Soc. Symp. 732E (2002) I1.2.1
12. Kamigata Y., Kurata Y., Masuda K., Amanokura J., Yoshida M., and Hanazono M. Proc. Mater. Res. Soc. Symp. 671 (2001) M 1.3.1
13. Matsuda T., Takahashi H., Tsurugaya M., Miyazaki K., Doy T.K., and Kinoshita M. J. Electrochem. Soc. 150 (2003) G532
14. Gorantla V.R.K., Babel A., Pandija S., and Babu S.V. Electrochem. Solid State Lett. 8 (2005) G131
15. V.R.K. Gorantla, Ph.D. Thesis, Clarkson University, 2004.
16. Gorantla V.R.K., Assiongbon K.A., Babu S.V., and Roy D. J. Electrochem. Soc. 152 (2005) G404
17. Assiongbon K.A., Emery S.B., Pettit C.M., Babu S.V., and Roy D. Mater. Chem. Phys. 86 (2004) 347
18. http://people.clarkson.edu/∼samoy/ECMP.htm
19. Garland J.E., Pettit C.M., and Roy D. Electrochim. Acta 49 (2004) 2623
20. Jindal A., Hegde S., and Babu S.V. J. Electrochem. Soc. 150 (2003) G314
21. Pettit C.M., Garland J.E., Walters M.J., and Roy D. Electrochim. Acta 49 (2004) 3293
22. Garland J.E., Pettit C.M., Walters M.J., and Roy D. Surf. Interface Anal. 31 (2001) 492
23. Kettler R.M., Wesolowski D.J., and Palmer D.A. J. Chem. Eng. Data 43 (1998) 337
24. Bester-Roga M., Tomsic M., Barthel J., Neueder R., and Apelblat A. J. Solution Chem. 31 (2002) 1
25. Hong Y., Patri U.B., Ramakrishnan S., Roy D., and Babu S.V. J. Mater. Res. 20 (2005) 3413
26. Hong Y., Roy D., and Babu S.V. Electrochem. Solid State Lett. 8 (2005) G297
27. Ramakrishnan S., Janjam S.V.S.B., Patri U.B., Roy D., and Babu S.V. Microelectron. Eng. 84 (2007) 80
28. Kallay N., and Matijević E. Langmuir 1 (1985) 195
29. Johnson S.B., Yoon T.H., Slowey A.J., and Brown G.E. Langmuir 20 (2004) 11480
30. Meitres L. J. Am. Chem. Soc. 72 (1950) 184
31. Cockerell L.D., and Woods P.H. J. Am. Chem. Soc. 80 (1958) 3856
32. Zouaoui A., Stéphan O., Carrieer M., and Moutet J.-C. J. Electroanal. Chem. 474 (1999) 113
33. Fenelon A.M., and Breslin C.B. Electrochim. Acta 47 (2002) 4467
34. Yano J., Tanaka M., and Honda S. Proceedings of PacRim-CMP Conference. December 6, 2004, Tokyo, Japan (2004) paper no. 28
35. Martin D.S., Cole R.J., and Haq S. Surf. Sci. 539 (2003) 171
36. Lovell M.A., and Roy D. Electrochim. Acta 43 (1998) 2117
37. Magaino S. Electrochim. Acta 42 (1997) 377
38. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, NACE International, Houston, 1974.
39. Hernandez J., Wrschka P., and Oehrlein G.S. J. Electrochem. Soc. 148 (2001) G389
40. Seal S., Kuiry S.C., and Heinmen B. Thin Solid Films 423 (2003) 243
41. Pettit C.M., and Roy D. Mater. Lett. 59 (2005) 3885
42. Kitajima N., Fukuzumi S.-.I., and Ono Y. J. Phys. Chem. 82 (1978) 1505
43. Lu J., Garland J.E., Pettit C.M., Babu S.V., and Roy D. J. Electrochem. Soc. 151 (2004) G717
44. Patil S., Sainkar S.R., and Patil P.P. Mater. Sci. Technol. 20 (2004) 795
45. Milazzo G., and Caroli S. Tables of Standard Electrode Potentials (1978), John Wiley, New York