Chemical roles of peroxide-based alkaline slurries in chemical-mechanical polishing of Ta: Investigation of surface reactions using time-resolved impedance spectroscopy

Materials Chemistry and Physics

Volumn 86, Issue 2-3, 2004, Pages 347-357

  Assiongbon, K A ^a   Emery, S B ^a   Pettit, C M ^a   Babu, S V ^a   Roy, D ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

Catalysis; Chemical mechanical polishing; Hydrogen peroxide; Impedance spectroscopy; Tantalum

Indexed keywords

CHEMICAL MECHANICAL POLISHING; ELECTROCHEMISTRY; HYDROGEN PEROXIDE; REACTION KINETICS; SOLUTIONS; SPECTROSCOPIC ANALYSIS; SURFACE REACTIONS; TANTALUM;

CONTROLLED MASS TRANSFER; OPEN CIRCUIT POTENTIAL;

SLURRIES;

EID: 2942642388     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.03.016     Document Type: Article

References (49)

1. S.V. Babu, K.C. Cadien, H. Yano (Eds.), Chemical-mechanical Polishing 2001: Advances and Future Challenges, Materials Research Society, Warrendale, PA, 2001, p. 1.
2. J.M. Steigerwald, S.P. Murarka, R.J. Gutmann, Chemical-mechanical Planarization of Microelectronic Materials, Wiley, New York, 1997.
3. J. Lu, J.E. Garland, C.M. Pettit, S.V. Babu, D. Roy, J. Electrochem. Soc., submitted for publication.
4. Walters M.J., Garland J.E., Pettit C.M., Zimmerman D.S., Marr D.R., Roy D. J. Electroanal. Chem. 499:2001;48.
5. Garland J.E., Assiongbon K.A., Pettit C.M., Emery S.B., Roy D. Electrochim. Acta. 47:2002;3113.
6. Popkirov G.S., Schindler R.N. Electrochim. Acta. 38:1993;861.
7. A.J. Bard, L.R. Faulkner, Electrochemical Methods, Fundamentals and Applications, Wiley, New York, 1980.
8. Garland J.E., Pettit C.M., Walters M.J., Roy D. Surf. Interf. Anal. 31:2001;492.
9. A. Jindal, Ph.D. Thesis, Clarkson University, 2002.
10. Park S.-S., Cho C.-H., Ahn Y. Tribology Int. 33:2000;723.
11. Lu Z., Lee S.-H., Babu S.V., Matijević E. J. Colloid Interf. Sci. 261:2003;55.
12. Hariharputhiran M., Zhang J., Ramarajan S., Keleher J.J., Li Y., Babu S.V. J. Electrochem. Soc. 147:2000;3820.
13. Aksu S., Doyle F. J. Electrochem. Soc. 149:2002;G352.
14. Du T., Tamboli D., Desai V. Microelectron. Eng. 69:2003;1.
15. Seal S., Kuiry S.C., Heinmen B. Thin Solid Films. 423:2003;243.
16. Ziomek-Moroz M., Miller A., Hawk J., Cadien K.C., Li D.Y. Wear. 255:2003;869.
17. Ramarajan S., Li Y., Hariharputhiran M., Her Y.-S., Babu S.V. Electrochem. Solid State Lett. 3:2000;232.
18. Kerrec O., Devilliers D., Groult H., Chemla M. Electrochim. Acta. 40:1995;719.
19. Kerrec O., Devilliers D., Groult H., Marcus P. Mater. Sci. Eng. B. 55:1998;134.
20. Macagno V., Schultze J.W. J. Electroanal. Chem. 180:1984;157.
21. Cavigliasso G.E., Esplandiu M.J., Macagno V.A. J. Appl. Electrochem. 28:1998;1213.
22. Wilhelmsen W. Electrochim. Acta. 33:1988;63.
23. Cabrera N., Mott N.F. Rep. Prog. Phys. 12:1949;163.
24. Bartles C., Schultze J.W., Stimming U., Habib M.A. Electrochim. Acta. 27:1982;129.
25. Patrito E.M., Torresi R.M., Levia E.P.M., Macagno V.A. J. Electrochem. Soc. 137:1990;524.
26. L. Young, Anodic Oxide Films, Academic Press, New York, 1961.
27. Kato M. Electrochim. Acta. 21:1976;593.
28. Lecuyer S., Quemerais A., Jezequel G. Surf. Interf. Anal. 18:1992;257.
29. J.W. Schultze, in: R.P. Frankenthal, J. Kruger (Eds.), Passivity of Metals, Electrochemical Society, Princeton, NJ, 1978, p. 83.
30. Randall J.J. Jr., Bernard W.J., Wilkinson P.R. Electrochim. Acta. 10:1965;183.
31. Lovell M.A., Roy D. Electrochim. Acta. 43:1998;2117.
32. Macdonald D.D. Electrochim. Acta. 35:1990;1509.
33. Macdonald J.R. Electrochim. Acta. 38:1993;1883.
34. Abd El-Rahman H.A., Abou-Romia M.M. J. Appl. Electrochem. 20:1990;39.
35. Gad-Allah A.G., Abd El-Rahman H.A. Corrosion. 43:1987;698.
36. Tilak B.V., Conway B.E. Electrochim. Acta. 21:1976;745.
37. http://www.clarkson.edu/~surop/fteis.htm.
38. Boukamp B.A. Solid State Ionics. 20:1986;31.
39. Senda M., Delahay P. J. Phys. Chem. 65:1961;1580.
40. M. Sluyters-Rebach, J.H. Sluyters, in: E. Yeager, J.O'M. Bockris, B.E. Conway, S. Sarangapani (Eds.), Comprehensive Treatise of Electrochemistry, vol. 9, Plenum, New York, 1980, p. 177.
41. Robin A. J. Appl. Electrochem. 33:2003;37.
42. Badawy W.A., Gad-Allah A.G., Rehan H.H. J. Appl. Electrochem. 17:1987;559.
43. Aveston J., Johnson J.S. Inorg. Chem. 3:1964;1051.
44. Nelson W.H., Tobias R.S. Inorg. Chem. 2:1963;985.
45. Lin S.-S., Gurol M.D. Environ. Sci. Technol. 32:1998;1417.
46. Kitajima N., Fukuzumi S.-I., Ono Y. J. Phys. Chem. 82:1978;1505.
47. Miller C.M., Valentine R.L. Water Res. 33:1999;2805.
48. Weiss J. Adv. Catal. 4:1952;343.
49. Kuiry S.C., Seal S., Fei W., Ramsdell J., Desai V.H., Li Y., Babu S.V., Wood B. J. Electrochem. Soc. 150:2003;C36.