Relative roles of H2O2 and glycine in CMP of copper studied with impedance spectroscopy

Journal of the Electrochemical Society

Volumn 151, Issue 10, 2004, Pages

  Lu, J ^a   Garland, J E ^a   Pettit, C M ^a   Babu, S V ^a   Roy, D ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; FOURIER TRANSFORMS; OXIDATION; PH EFFECTS; POLARIZATION; SURFACE REACTIONS;

CHEMICAL MECHANICAL POLISHING (CMP); DATA ACQUISITION CARDS; INHOMOGENEITY; SURFACE AREAS;

COPPER;

EID: 8644240247     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1795256     Document Type: Article

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