Chemical mechanical polishing of dielectric films using mixed abrasive slurries

Journal of the Electrochemical Society

Volumn 150, Issue 5, 2003, Pages

  Jindal, A ^a   Hegde, S ^a   Babu, S V ^a,b  

^a Clarkson University   (United States)

^b CLARKSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ALUMINA; CHEMICAL MECHANICAL POLISHING; PARTICLE SIZE ANALYSIS; SILICA; SILICON NITRIDE; SLURRIES; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINA ABRASIVES; CERIA ABRASIVES; DRIED SLURRY PARTICLES; MIXED ABRASIVE SLURRIES; PARTICLE-FILM INTERACTION; PARTICLE-PARTICLE INTERACTION;

DIELECTRIC FILMS;

EID: 0037840413     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1564110     Document Type: Article

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