Study of Ti/Au, Ti/Al/Au, and Ti/Al/Ni/Au ohmic contacts to n-GaN

Applied Physics A: Materials Science and Processing

Volumn 78, Issue 5, 2004, Pages 729-731

  Qin, Z X ^a   Chen, Z Z ^a   Tong, Y Z ^a   Ding, X M ^a   Hu, X D ^a   Yu, T J ^a   Zhang, G Y ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; GALLIUM NITRIDE; LIGHT EMITTING DIODES; OHMIC CONTACTS; THERMODYNAMIC STABILITY; TRANSMISSION LINE THEORY;

ANNEALING TEMPERATURE; INTERDIFFUSION; MULTI-METAL CONTACTS; WORK FUNCTION;

TITANIUM ALLOYS;

EID: 2942709375     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1989-0     Document Type: Article

References (19)

1. S. Nakamura, T. Mukai, M. Senoh: Jpn. J. Appl. Phys. 34, L687 (1995)
2. S. Nakamura, M. Senoh, S. Naghama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyoku: Jpn. J. Appl. Phys. 35, 74 (1996)
3. S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyoku, Y. Sugimoto, T. Kozaki, H. Umemto, M. Sano, K. Chocho: Jpn. J. Appl. Phys. 36, L1568 (1997)
4. J.S. Foresi, T.D. Moustakas: Appl. Phys. Lett. 62, 2859 (1993)
5. J. Burm, K. Chu, W.A. Davis, W.J. Schaff, T.J. Eustis, L.F. Eastman: Appl. Phys. Lett. 70, 464 (1997)
6. B.P. Luther, S.E. Mohney, T.N. Jackson, M.A. Khan, Q. Chen, J.W. Yang: Appl. Phys. Lett. 70, 57 (1997.)
7. Z.-F. Fan, S.N. Mohammad, W. Kim, O. Aktas, A.E. Botchkarev, H. Morkoc: Appl. Phys. Lett. 68, 1672 (1996)
8. B.P. Luther, J.M. DeLucca, S.E. Mohney, R.F. Karlicek Jr.: Appl. Phys. Lett. 71, 3859 (1997)
9. H.W. Jang, C.M. Jeon, J.K. Kim, J.L. Lee: Appl. Phys. Lett. 78, 2015 (2001)
10. E.F. Chor, D. Zhang, H. Gong, G.L. Chen, T.Y.F. Liew: J. Appl. Phys. 90, 1242 (2001)
11. D.-F. Wang, F. Shiwei, C. Lu, A. Motayed, M. Jah, S.n. Mohammad, K.A. Jones, L. Salamanca-Riba: J. Appl. Phys. 89, 6214 (2001)
12. C.-T. Lee, H.-W. Kao: Appl. Phys. Lett. 76, 2364 (2000)
13. C. Lu, H. Chen, X. Lv, X. Xie, S.N. Mohammad: J. Appl. Phys. 91, 9218 (2002)
14. J.K. Kim, H.W. Jang, J.-L. Lee: J. Appl. Phys. 91, 9214 (2002)
15. S. Murai, H. Masuda, Y. Koide, M. Murakami: Appl. Phys. Lett. 80, 2934 (2002)
16. Z.M. Zhao, R.L. Jiang, P. Chen, D.J. Xi, H.Q. Yu, B. Shen, R. Zhang, Y. Shi, S.L. Ou, Y.D. Zheng: Appl. Phys. Lett. 79, 218 (2001)
17. L.L. Smith, R.F. Davis, M.J. Kim, R.W. Carpenter, Y. Huang: J. Mater. Res. 11, 2257 (1996)
18. E. Kaminska, A. Piotrowska, M. Gaziewicz, S. Kasjaniuk, A. Barcz, E. Dynowska, M.D. Bremser, O.H. Nam, R.F. Davis: Mater. Res. Soc. Symp. Proc. 449, 1055 (1997)
19. M.E. Lin, Z. Ma, F.Y. Huang, Z.F. Fan, L.H. Allen, H. Markoc: Appl. Phys. Lett. 64, 1003 (1994)