메뉴 건너뛰기




Volumn 53, Issue 6, 2006, Pages 3158-3165

Total ionizing dose effects on triple-gate FETs

Author keywords

Fully depleted; Multiple gate transistors; Non planar architectures; Silicon on insulator (SOI); Total ionizing dose tolerance

Indexed keywords

ELECTROSTATIC POTENTIAL; IONIZING DOSE EFFECTS; NONPLANAR DEVICES; NONPLANAR TRIPLE-GATE TRANSISTORS;

EID: 33846327911     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNS.2006.884351     Document Type: Conference Paper
Times cited : (88)

References (30)
  • 1
    • 33846333200 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors, Online, Available
    • International Technology Roadmap for Semiconductors 2005 [Online]. Available: http://public.itrs.net/
    • (2005)
  • 2
    • 0037566742 scopus 로고    scopus 로고
    • Frontiers of silicon on insulator
    • G. K. Celler and S. Cristoloveanu, "Frontiers of silicon on insulator," J. Appl. Phys., vol. 93, no. 3, p. 4955, 2003.
    • (2003) J. Appl. Phys , vol.93 , Issue.3 , pp. 4955
    • Celler, G.K.1    Cristoloveanu, S.2
  • 4
    • 0035714801 scopus 로고    scopus 로고
    • FD/DG-SOI MOSFET-A viable approach to overcoming the device scaling limit
    • D. Hisamoto, "FD/DG-SOI MOSFET-A viable approach to overcoming the device scaling limit," in Proc. IEDM Tech. Dig., 2001, p. 429.
    • (2001) Proc. IEDM Tech. Dig , pp. 429
    • Hisamoto, D.1
  • 11
    • 0028694250 scopus 로고
    • Radiation response of fully-depleted MOS transistors fabricated in SIMOX
    • W. C. Jenkins and S. T. Liu, "Radiation response of fully-depleted MOS transistors fabricated in SIMOX," IEEE Trans. Nucl. Sci., vol. NS-41, no. 6, 1994.
    • (1994) IEEE Trans. Nucl. Sci , vol.NS-41 , Issue.6
    • Jenkins, W.C.1    Liu, S.T.2
  • 14
  • 17
    • 8544236283 scopus 로고    scopus 로고
    • Introduction to SOI MOSFETs: Context, radiation effects, and future trends
    • S. Cristoloveanu and V. Ferlet-Cavrois, "Introduction to SOI MOSFETs: Context, radiation effects, and future trends," Int. J. High Speed Electron. Syst., vol. 14, no. 2, p. 465, 2004.
    • (2004) Int. J. High Speed Electron. Syst , vol.14 , Issue.2 , pp. 465
    • Cristoloveanu, S.1    Ferlet-Cavrois, V.2
  • 19
    • 0020830319 scopus 로고
    • Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFET's
    • H. K. Lim and J. G. Fossum, "Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFET's," IEEE Trans. Electron Dev., vol. ED-30, no. 10, p. 1244, 1983.
    • (1983) IEEE Trans. Electron Dev , vol.ED-30 , Issue.10 , pp. 1244
    • Lim, H.K.1    Fossum, J.G.2
  • 22
  • 25
    • 0036498428 scopus 로고    scopus 로고
    • Fringing fields in sub-0.1 μm fully depleted SOI MOSFETs: Optimization of device architecture
    • T. Ernst, C. Tinella, C. Raynaud, and S. Cristoloveanu, "Fringing fields in sub-0.1 μm fully depleted SOI MOSFETs: Optimization of device architecture," Solid-State Electron., vol. 46, no. 3, p. 373, 2002.
    • (2002) Solid-State Electron , vol.46 , Issue.3 , pp. 373
    • Ernst, T.1    Tinella, C.2    Raynaud, C.3    Cristoloveanu, S.4
  • 26
    • 33846266649 scopus 로고    scopus 로고
    • ISE TCAD Manual: Dessis, 2004, ISE-Synopsys, TCAD Manual: Dessis Release 10.0.
    • ISE TCAD Manual: Dessis, 2004, ISE-Synopsys, TCAD Manual: Dessis Release 10.0.
  • 29
    • 84863715099 scopus 로고    scopus 로고
    • Total dose effects: Modeling for present and future
    • J. L. Leray, "Total dose effects: Modeling for present and future," in Proc. NSREC Short Course, 1999.
    • (1999) Proc. NSREC Short Course
    • Leray, J.L.1
  • 30
    • 1442360362 scopus 로고    scopus 로고
    • Multiple-gate SOI MOSFETs
    • J. P. Colinge, "Multiple-gate SOI MOSFETs," Solid State Electron., vol. 48, p. 897, 2004.
    • (2004) Solid State Electron , vol.48 , pp. 897
    • Colinge, J.P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.