-
1
-
-
33846333200
-
-
International Technology Roadmap for Semiconductors, Online, Available
-
International Technology Roadmap for Semiconductors 2005 [Online]. Available: http://public.itrs.net/
-
(2005)
-
-
-
2
-
-
0037566742
-
Frontiers of silicon on insulator
-
G. K. Celler and S. Cristoloveanu, "Frontiers of silicon on insulator," J. Appl. Phys., vol. 93, no. 3, p. 4955, 2003.
-
(2003)
J. Appl. Phys
, vol.93
, Issue.3
, pp. 4955
-
-
Celler, G.K.1
Cristoloveanu, S.2
-
3
-
-
0025575976
-
Silicon on insulator "gate all around" device
-
J.-P. Colinge, M. H. Gao, A. Romano-Rodriguez, H. Maes, and C. Claeys, "Silicon on insulator "gate all around" device," in Proc. IEDM Tech. Dig., 1990, p. 595.
-
(1990)
Proc. IEDM Tech. Dig
, pp. 595
-
-
Colinge, J.-P.1
Gao, M.H.2
Romano-Rodriguez, A.3
Maes, H.4
Claeys, C.5
-
4
-
-
0035714801
-
FD/DG-SOI MOSFET-A viable approach to overcoming the device scaling limit
-
D. Hisamoto, "FD/DG-SOI MOSFET-A viable approach to overcoming the device scaling limit," in Proc. IEDM Tech. Dig., 2001, p. 429.
-
(2001)
Proc. IEDM Tech. Dig
, pp. 429
-
-
Hisamoto, D.1
-
5
-
-
0035340554
-
Sub-50 nm P-channel FinFET
-
X. Huang, W.-C. Lee, C. Kuo, D. Hisamoto, L. Chang, J. Kedzierski, E. H. Anderson, H. Takeuchi, Y.-K. Choi, K. Asano, V. Subramanian, T.-J. King, J. Bokor, and C. Hu, "Sub-50 nm P-channel FinFET," IEEE Trans. ElectronDev., vol. 48, no. 5, p. 880, 2001.
-
(2001)
IEEE Trans. ElectronDev
, vol.48
, Issue.5
, pp. 880
-
-
Huang, X.1
Lee, W.-C.2
Kuo, C.3
Hisamoto, D.4
Chang, L.5
Kedzierski, J.6
Anderson, E.H.7
Takeuchi, H.8
Choi, Y.-K.9
Asano, K.10
Subramanian, V.11
King, T.-J.12
Bokor, J.13
Hu, C.14
-
6
-
-
0036923594
-
Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation
-
J. Kedzierski, E. J. Nowak, T. Kanarsky, Y. Zhang, D. Boyd, R. Carruthers, C. Cabral, R. Amos, C. Lavoie, R. A. Roy, J. Newbury, E. Sullivan, J. Benedict, P. Saunders, K. Wong, D. Canaperi, M. Krishnan, K.-L. Lee, B. A. Rainey, D. M. Fried, P. Cottrell, H.-S. P. Wong, M. leong, and W. Haensch, "Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation," in Proc. IEDM Tech. Dig., 2002, p. 247.
-
(2002)
Proc. IEDM Tech. Dig
, pp. 247
-
-
Kedzierski, J.1
Nowak, E.J.2
Kanarsky, T.3
Zhang, Y.4
Boyd, D.5
Carruthers, R.6
Cabral, C.7
Amos, R.8
Lavoie, C.9
Roy, R.A.10
Newbury, J.11
Sullivan, E.12
Benedict, J.13
Saunders, P.14
Wong, K.15
Canaperi, D.16
Krishnan, M.17
Lee, K.-L.18
Rainey, B.A.19
Fried, D.M.20
Cottrell, P.21
Wong, H.-S.P.22
leong, M.23
Haensch, W.24
more..
-
7
-
-
21044452456
-
Bonded planar double-metal-gate NMOS transistors down to 10 nm
-
M. Vinet, T. Poiroux, J. Widiez, J. Lolivier, B. Previtali, C. Vizioz, B. Guillaumot, Y. Le Tiec, P. Besson, B. Biasse, F. Allain, M. Cassé, D. Lafond, J. M. Hartmann, Y. Morand, J. Chiaroni, and S. Deleonibus, "Bonded planar double-metal-gate NMOS transistors down to 10 nm," IEEE Electron Device Lett., vol. 26, no. 5, p. 317, 2005.
-
(2005)
IEEE Electron Device Lett
, vol.26
, Issue.5
, pp. 317
-
-
Vinet, M.1
Poiroux, T.2
Widiez, J.3
Lolivier, J.4
Previtali, B.5
Vizioz, C.6
Guillaumot, B.7
Le Tiec, Y.8
Besson, P.9
Biasse, B.10
Allain, F.11
Cassé, M.12
Lafond, D.13
Hartmann, J.M.14
Morand, Y.15
Chiaroni, J.16
Deleonibus, S.17
-
8
-
-
0036932378
-
25 nm CMOS omega FETs
-
F.-L. Yang, H.-Y. Chen, F.-C. Chen, C.-C. Huang, C.-Y. Chang, H.-K. Chiu, C.-C. Lee, C.-C. Chen, H.-J. Tao, Y.-C. Yeo, M.-S. Liang, and C. Hu, "25 nm CMOS omega FETs," in Proc. IEDM Tech. Dig., 2002, p. 255.
-
(2002)
Proc. IEDM Tech. Dig
, pp. 255
-
-
Yang, F.-L.1
Chen, H.-Y.2
Chen, F.-C.3
Huang, C.-C.4
Chang, C.-Y.5
Chiu, H.-K.6
Lee, C.-C.7
Chen, C.-C.8
Tao, H.-J.9
Yeo, Y.-C.10
Liang, M.-S.11
Hu, C.12
-
9
-
-
0036923438
-
FinFET scaling to 10 nm gate length
-
B. Yu, L. Chang, S. Ahmed, H. Wang, S. Bell, C.-Y. Yang, C. Tabery, C. Ho, Q. Xiang, T.-J. King, J. Bokor, C. Hu, M.-R. Lin, and D. Kyser, "FinFET scaling to 10 nm gate length," IEDM Tech. Dig., p. 251, 2002.
-
(2002)
IEDM Tech. Dig
, pp. 251
-
-
Yu, B.1
Chang, L.2
Ahmed, S.3
Wang, H.4
Bell, S.5
Yang, C.-Y.6
Tabery, C.7
Ho, C.8
Xiang, Q.9
King, T.-J.10
Bokor, J.11
Hu, C.12
Lin, M.-R.13
Kyser, D.14
-
10
-
-
0038454484
-
Radiation effects in SOI technologies
-
J. R. Schwank, V. Ferlet-Cavrois, M. R. Shaneyfelt, P. Paillet, and P. E. Dodd, "Radiation effects in SOI technologies," IEEE Trans. Nucl. Sci., vol. 50, no. 3, p. 522, 2003.
-
(2003)
IEEE Trans. Nucl. Sci
, vol.50
, Issue.3
, pp. 522
-
-
Schwank, J.R.1
Ferlet-Cavrois, V.2
Shaneyfelt, M.R.3
Paillet, P.4
Dodd, P.E.5
-
11
-
-
0028694250
-
Radiation response of fully-depleted MOS transistors fabricated in SIMOX
-
W. C. Jenkins and S. T. Liu, "Radiation response of fully-depleted MOS transistors fabricated in SIMOX," IEEE Trans. Nucl. Sci., vol. NS-41, no. 6, 1994.
-
(1994)
IEEE Trans. Nucl. Sci
, vol.NS-41
, Issue.6
-
-
Jenkins, W.C.1
Liu, S.T.2
-
12
-
-
0030172699
-
X-radiation response of SIMOX buried oxides: Influence of the fabrication process
-
P. Paillet, J. L. Autran, O. Flament, J. L. Leray, B. Aspar, and A. J. Auberton-Herve, "X-radiation response of SIMOX buried oxides: Influence of the fabrication process," IEEE Trans. Nucl. Sci., vol. 43, no. 3, p. 821, 1996.
-
(1996)
IEEE Trans. Nucl. Sci
, vol.43
, Issue.3
, pp. 821
-
-
Paillet, P.1
Autran, J.L.2
Flament, O.3
Leray, J.L.4
Aspar, B.5
Auberton-Herve, A.J.6
-
13
-
-
0034452278
-
Worst-case bias during total dose irradiation of SOI transistors
-
V. Ferlet-Cavrois, T. Colladant, P. Paillet, J. L. Leray, O. Musseau, J. R. Schwank, M. R. Shaneyfelt, J. L. Pelloie, and J. Du Port de Pontcharra, "Worst-case bias during total dose irradiation of SOI transistors," IEEE Trans. Nucl. Sci., vol. 47, no. 6, p. 2183, 2000.
-
(2000)
IEEE Trans. Nucl. Sci
, vol.47
, Issue.6
, pp. 2183
-
-
Ferlet-Cavrois, V.1
Colladant, T.2
Paillet, P.3
Leray, J.L.4
Musseau, O.5
Schwank, J.R.6
Shaneyfelt, M.R.7
Pelloie, J.L.8
Du Port de Pontcharra, J.9
-
14
-
-
0034206978
-
New insights into a fully-depleted SOI transistor response after total-dose irradiation
-
J. R. Schwank, M. R. Shaneyfelt, P. E. Dodd, J. A. Burns, C. L. Kearst, and P. W. Wyatt, "New insights into a fully-depleted SOI transistor response after total-dose irradiation," IEEE Trans. Nucl. Sci., vol. 47, no. 3, p. 604, 2000.
-
(2000)
IEEE Trans. Nucl. Sci
, vol.47
, Issue.3
, pp. 604
-
-
Schwank, J.R.1
Shaneyfelt, M.R.2
Dodd, P.E.3
Burns, J.A.4
Kearst, C.L.5
Wyatt, P.W.6
-
15
-
-
11044235408
-
Total dose effects on double gate fully depleted SOI MOSFETs
-
B. Jun, H. D. Xiong, A. L. Sternberg, C. R. Cirba, D. C. Chen, R. D. Schrimpf, D. M. Fleetwood, J. R. Schwank, and S. Cristoloveanu, "Total dose effects on double gate fully depleted SOI MOSFETs," IEEE Trans. Nucl. Sci., vol. 51, no. 6, p. 3767, 2004.
-
(2004)
IEEE Trans. Nucl. Sci
, vol.51
, Issue.6
, pp. 3767
-
-
Jun, B.1
Xiong, H.D.2
Sternberg, A.L.3
Cirba, C.R.4
Chen, D.C.5
Schrimpf, R.D.6
Fleetwood, D.M.7
Schwank, J.R.8
Cristoloveanu, S.9
-
16
-
-
32344447464
-
Dose radiation effects in FinFETs
-
X. Wu, P.-C. H. Chan, A. Orozco, A. Vazquez, A. Chaudhry, and J. P. Colinge, "Dose radiation effects in FinFETs," Solid State Electron., vol. 50, p. 287, 2006.
-
(2006)
Solid State Electron
, vol.50
, pp. 287
-
-
Wu, X.1
Chan, P.-C.H.2
Orozco, A.3
Vazquez, A.4
Chaudhry, A.5
Colinge, J.P.6
-
17
-
-
8544236283
-
Introduction to SOI MOSFETs: Context, radiation effects, and future trends
-
S. Cristoloveanu and V. Ferlet-Cavrois, "Introduction to SOI MOSFETs: Context, radiation effects, and future trends," Int. J. High Speed Electron. Syst., vol. 14, no. 2, p. 465, 2004.
-
(2004)
Int. J. High Speed Electron. Syst
, vol.14
, Issue.2
, pp. 465
-
-
Cristoloveanu, S.1
Ferlet-Cavrois, V.2
-
18
-
-
30344483385
-
2 down to 10 nm
-
2 down to 10 nm," in Symp. VLSI Tech., 2005.
-
(2005)
Symp. VLSI Tech
-
-
Jahan, C.1
Faynot, O.2
Casse, M.3
Ritzenthaler, R.4
Brevard, L.5
Tosti, L.6
Garros, X.7
Vizioz, C.8
Allain, F.9
Papon, A.-M.10
Dansas, H.11
Martin, F.12
Vinet, M.13
Guillaumot, B.14
Toffoli, A.15
Giffard, B.16
Deleonibus, S.17
-
19
-
-
0020830319
-
Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFET's
-
H. K. Lim and J. G. Fossum, "Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFET's," IEEE Trans. Electron Dev., vol. ED-30, no. 10, p. 1244, 1983.
-
(1983)
IEEE Trans. Electron Dev
, vol.ED-30
, Issue.10
, pp. 1244
-
-
Lim, H.K.1
Fossum, J.G.2
-
20
-
-
0442311975
-
Coupling effects and channels separation in FinFETs
-
F. Daugé, J. Pretet, S. Cristoloveanu, A. Vandooren, L. Mathew, J. Jomaah, and B.-Y. Nguyen, "Coupling effects and channels separation in FinFETs," Solid-State Electron., vol. 48, p. 535, 2004.
-
(2004)
Solid-State Electron
, vol.48
, pp. 535
-
-
Daugé, F.1
Pretet, J.2
Cristoloveanu, S.3
Vandooren, A.4
Mathew, L.5
Jomaah, J.6
Nguyen, B.-Y.7
-
21
-
-
33646519429
-
Lateral coupling and immunity to substrate effect in ω FET devices
-
R. Ritzenthaler, S. Cristoloveanu, O. Faynot, C. Jahan, A. Kuriyama, L. Brevard, and S. Deleonibus, "Lateral coupling and immunity to substrate effect in ω FET devices," Solid State Electron., vol. 50, p. 558, 2006.
-
(2006)
Solid State Electron
, vol.50
, pp. 558
-
-
Ritzenthaler, R.1
Cristoloveanu, S.2
Faynot, O.3
Jahan, C.4
Kuriyama, A.5
Brevard, L.6
Deleonibus, S.7
-
22
-
-
0029545449
-
Trapping-detrapping properties of irradiated ultra-thin SIMOX buried oxides
-
P. Paillet, J. L. Autran, J. L. Leray, B. Aspar, and A. J. Auberton-Herve, "Trapping-detrapping properties of irradiated ultra-thin SIMOX buried oxides," IEEE Trans. Nucl. Sci., vol. 42, no. 6, p. 2108, 1995.
-
(1995)
IEEE Trans. Nucl. Sci
, vol.42
, Issue.6
, pp. 2108
-
-
Paillet, P.1
Autran, J.L.2
Leray, J.L.3
Aspar, B.4
Auberton-Herve, A.J.5
-
23
-
-
0026384497
-
Charge yield for Cobalt-60 and 10-keV x-ray irradiations of MOS devices
-
M. R. Shaneyfelt, D. M. Fleetwood, J. R. Schwank, and H. L. Hughes, "Charge yield for Cobalt-60 and 10-keV x-ray irradiations of MOS devices," IEEE Trans. Nucl. Sci., vol. 38, p. 1187, 1991.
-
(1991)
IEEE Trans. Nucl. Sci
, vol.38
, pp. 1187
-
-
Shaneyfelt, M.R.1
Fleetwood, D.M.2
Schwank, J.R.3
Hughes, H.L.4
-
24
-
-
33144457311
-
Total ionizing dose effects on deca-nanometer fully depleted SOI devices
-
P. Paillet, M. Gaillardin, V. Ferlet-Cavrois, O. Faynot, C. Jahan, L. Tosti, and S. Cristoloveanu, "Total ionizing dose effects on deca-nanometer fully depleted SOI devices," IEEE Trans. Nucl. Sci., vol. 52, no. 6, p. 2345, 2005.
-
(2005)
IEEE Trans. Nucl. Sci
, vol.52
, Issue.6
, pp. 2345
-
-
Paillet, P.1
Gaillardin, M.2
Ferlet-Cavrois, V.3
Faynot, O.4
Jahan, C.5
Tosti, L.6
Cristoloveanu, S.7
-
25
-
-
0036498428
-
Fringing fields in sub-0.1 μm fully depleted SOI MOSFETs: Optimization of device architecture
-
T. Ernst, C. Tinella, C. Raynaud, and S. Cristoloveanu, "Fringing fields in sub-0.1 μm fully depleted SOI MOSFETs: Optimization of device architecture," Solid-State Electron., vol. 46, no. 3, p. 373, 2002.
-
(2002)
Solid-State Electron
, vol.46
, Issue.3
, pp. 373
-
-
Ernst, T.1
Tinella, C.2
Raynaud, C.3
Cristoloveanu, S.4
-
26
-
-
33846266649
-
-
ISE TCAD Manual: Dessis, 2004, ISE-Synopsys, TCAD Manual: Dessis Release 10.0.
-
ISE TCAD Manual: Dessis, 2004, ISE-Synopsys, TCAD Manual: Dessis Release 10.0.
-
-
-
-
27
-
-
0036952439
-
Comparison of charge yield in MOS devices for different radiation sources
-
P. Paillet, J. R. Schwank, M. R. Shaneyfelt, V. Ferlet-Cavrois, R. A. Loemker, O. Flament, and E. W. Blackmore, "Comparison of charge yield in MOS devices for different radiation sources," IEEE Trans. Nucl. Sci., vol. 49, no. 6, p. 2656, 2002.
-
(2002)
IEEE Trans. Nucl. Sci
, vol.49
, Issue.6
, pp. 2656
-
-
Paillet, P.1
Schwank, J.R.2
Shaneyfelt, M.R.3
Ferlet-Cavrois, V.4
Loemker, R.A.5
Flament, O.6
Blackmore, E.W.7
-
28
-
-
0032097342
-
2
-
2," IEEE Trans. Nucl. Sci., vol. 45, no. 3, p. 1379, 1998.
-
(1998)
IEEE Trans. Nucl. Sci
, vol.45
, Issue.3
, pp. 1379
-
-
Paillet, P.1
Touron, J.L.2
Leray, J.L.3
Cirba, C.4
Michez, A.5
-
29
-
-
84863715099
-
Total dose effects: Modeling for present and future
-
J. L. Leray, "Total dose effects: Modeling for present and future," in Proc. NSREC Short Course, 1999.
-
(1999)
Proc. NSREC Short Course
-
-
Leray, J.L.1
-
30
-
-
1442360362
-
Multiple-gate SOI MOSFETs
-
J. P. Colinge, "Multiple-gate SOI MOSFETs," Solid State Electron., vol. 48, p. 897, 2004.
-
(2004)
Solid State Electron
, vol.48
, pp. 897
-
-
Colinge, J.P.1
|