-
3
-
-
0031166726
-
Total Dose Effects on a Fully-Depleted SOI NMOSFET and Its Lateral Parasitic Transistor
-
V. Ferlet-Cavrois, O. Musseau, J. L. Leray, J. L. Pelloie, and C. Raynaud,Total Dose Effects on a Fully-Depleted SOI NMOSFET and Its Lateral Parasitic TransistorIEEE Trans. Elect. Dev. 44, 965 (June 1997).
-
IEEE Trans. Elect. Dev. 44, 965 (June 1997).
-
-
Ferlet-Cavrois, V.1
Musseau, O.2
Leray, J.L.3
Pelloie, J.L.4
Raynaud, C.5
-
4
-
-
0030365375
-
Total Dose Hardening of SIMOX Buried Oxides for Fully-Depleted Devices in Rad-Tolerant Applications
-
F. T. Brady, H. L. Hughes, P. J. McMarr, and B. Mrstik,Total Dose Hardening of SIMOX Buried Oxides for Fully-Depleted Devices in Rad-Tolerant ApplicationsIEEE Trans. Nud. Sei, 43, 2646 (Dec. 1996).
-
IEEE Trans. Nud. Sei, 43, 2646 (Dec. 1996).
-
-
Brady, F.T.1
Hughes, H.L.2
McMarr, P.J.3
Mrstik, B.4
-
5
-
-
0028699525
-
Fully-Depleted Submicron SOI for Radiation Hardened Applications
-
F, T. Brady, T. Scott, R. Brown, J. Damato, and N. HadcladFully-Depleted Submicron SOI for Radiation Hardened ApplicationsIEEE Trans. Nucl. Sei. 41, 2305 (Dec. 1994).
-
IEEE Trans. Nucl. Sei. 41, 2305 (Dec. 1994).
-
-
Brady, F.T.1
Scott, T.2
Brown, R.3
Damato, J.4
Hadclad, N.5
-
7
-
-
0032314292
-
Total Dose Latch in Short Channel NMOS/SOI Transistors
-
V. Ferlet-Cavrois, S. Quoizola, O. Musscau, O. Flamem, J. L. LerayTotal Dose Latch in Short Channel NMOS/SOI TransistorsIEEE Trans. Nucl Sei. 45, 2458 (Dec. 1998).
-
IEEE Trans. Nucl Sei. 45, 2458 (Dec. 1998).
-
-
Ferlet-Cavrois, V.1
Quoizola, S.2
Musscau, O.3
Flamem, O.4
Leray, J.L.5
-
9
-
-
33747376847
-
-
J. P. Colinge, Silicon-On-lnsulator Teehnologv: Materials to VLSI. Kiuwer Academic Publishers, Boston, 1997.
-
J. P. Colinge, Silicon-On-lnsulator Teehnologv: Materials to VLSI. Kiuwer Academic Publishers, Boston, 1997.
-
-
-
-
11
-
-
33747369180
-
-
S. Cristoloveanu and S. S. Li, Electrical Characterization of Silicon-On-Insulator Materials and Devices. Kiuwer Academic Publishers, Boston, 1995.
-
[Il] S. Cristoloveanu and S. S. Li, Electrical Characterization of Silicon-On-Insulator Materials and Devices. Kiuwer Academic Publishers, Boston, 1995.
-
-
-
-
12
-
-
0026172212
-
Analysis and Control of Floating-Body Bipolar Effects in Fully Depleted Submicrometer SOI MOSFET's
-
J.-Y. Choi and J, G. PossumAnalysis and Control of Floating-Body Bipolar Effects in Fully Depleted Submicrometer SOI MOSFET'slEEETmns. Electron Dev. 38, 1384 (June 1991).
-
LEEETmns. Electron Dev. 38, 1384 (June 1991).
-
-
Choi, J.-Y.1
Possum, J.G.2
-
13
-
-
4344630576
-
Investigation of Floating Body Effects in Silicon-onInsulator Metal-Oxide-Semiconductor Field-Effect Transistors
-
T. Ouisse, G. Ghibaudo, J. Brim, S. Cristoloveanu, and G. BorelInvestigation of Floating Body Effects in Silicon-onInsulator Metal-Oxide-Semiconductor Field-Effect TransistorsJ. Appl. Pkys. 70, 3912 (Oct. 1991).
-
J. Appl. Pkys. 70, 3912 (Oct. 1991).
-
-
Ouisse, T.1
Ghibaudo, G.2
Brim, J.3
Cristoloveanu, S.4
Borel, G.5
-
14
-
-
0032318033
-
Challenges in Hardening Technologies Using Shallow-Trench Isolation
-
M, R. Shaneyfelt, P. E. Dodd, B. L. Draper, and R, S. FloresChallenges in Hardening Technologies Using Shallow-Trench IsolationIEEE Trans. Nucl. Sei. 45, 2584 (Dec. 1998).
-
IEEE Trans. Nucl. Sei. 45, 2584 (Dec. 1998).
-
-
Shaneyfelt, M.R.1
Dodd, P.E.2
Draper, B.L.3
Flores, R.S.4
-
15
-
-
0025597502
-
Time-Dependent Hole and Electron Trapping Effects in SIMOX Buried Oxides
-
[IS] H. E. Boesch, Ir. T. L. Taylor, L. R. Kite, and W, E. BaileyTime-Dependent Hole and Electron Trapping Effects in SIMOX Buried OxidesIEEE Trans. Nucl. Sei. 37, 1982 (1992).
-
IEEE Trans. Nucl. Sei. 37, 1982 (1992).
-
-
Boesch, I.S.H.1
Taylor, I.T.L.2
Kite, L.R.3
Bailey, W.E.4
|