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Volumn 50, Issue 4, 2006, Pages 558-565

Lateral coupling and immunity to substrate effect in ΩFET devices

Author keywords

FET; Back gate biasing; Coupling effects; Drain induced virtual substrate biasing (DIVSB); FinFET; Lateral coupling; SOI

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; NUMERICAL ANALYSIS; THREE DIMENSIONAL;

EID: 33646519429     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2006.03.025     Document Type: Article
Times cited : (36)

References (11)
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  • 2
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    • Doyle B et al. Tri-gate fully depleted CMOS transistors: fabrication, design and layout, In: VLSI 2003 technical digest, 2003. p. 132-3.
  • 3
    • 33646529461 scopus 로고    scopus 로고
    • 2, In: VLSI 2005 technical digest, 2005. p. 112-3.
  • 5
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    • Yang F-L et al. 25 nm CMOS omega FETs, In: IEDM'02 technical digest, 2002. p. 255-8.
  • 6
    • 10844274144 scopus 로고    scopus 로고
    • Body effect in Tri- and Pi-gate SOI MOSFETs
    • Frei J., et al. Body effect in Tri- and Pi-gate SOI MOSFETs. IEEE Electron Dev Lett 25 12 (2004) 813-815
    • (2004) IEEE Electron Dev Lett , vol.25 , Issue.12 , pp. 813-815
    • Frei, J.1
  • 7
    • 0142185862 scopus 로고    scopus 로고
    • Pretet J, Cristoloveanu S, Skotnicki T, Monfray S. Short channel and back-gate coupling effects in silicon-on-nothing (SON) MOSFETs, In: IEEE international SOI conference, 2003. p. 122-3.
  • 8
    • 0442311975 scopus 로고    scopus 로고
    • Coupling effects and channel separation in FinFETs
    • Daugé F., et al. Coupling effects and channel separation in FinFETs. Solid-State Electronics 48 4 (2004) 535-542
    • (2004) Solid-State Electronics , vol.48 , Issue.4 , pp. 535-542
    • Daugé, F.1
  • 9
    • 31844443177 scopus 로고    scopus 로고
    • Ritzenthaler R, Faynot O, Jahan C, Cristoloveanu S. Corner and coupling effects in multiple-gate FETs, In: 207th meeting of the electrochemical society, silicon-on-insulator technology and devices session XII, 2005. p. 283-8.
  • 10
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    • Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFETs
    • Lim H.K., and Fossum J.G. Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFETs. IEEE Trans Electron Dev 30 10 (1983) 1244-1251
    • (1983) IEEE Trans Electron Dev , vol.30 , Issue.10 , pp. 1244-1251
    • Lim, H.K.1    Fossum, J.G.2
  • 11
    • 0033338764 scopus 로고    scopus 로고
    • Ernst T, Cristoloveanu S. Buried oxide fringing capacitance: a new physical model and its implication on SOI device scaling and architecture, In: IEEE international SOI conference, 1999. p. 38-9.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.