-
1
-
-
18044367189
-
-
edited by H.Ishiwara, M.Okuyama, and Y.Arimoto (Springer-Verlag, Berlin, Heidelberg
-
Y. Shimada, in Ferroelectric Random Access Memories: Fundamentals and Applications, edited by, H. Ishiwara, M. Okuyama, and, Y. Arimoto, (Springer-Verlag, Berlin, Heidelberg, 2004), Pt..
-
(2004)
Ferroelectric Random Access Memories: Fundamentals and Applications
-
-
Shimada, Y.1
-
3
-
-
0028482548
-
-
W. L. Warren, D. Dimos, B. A. Tuttle, R. D. Nasby, and G. E. Pike, Appl. Phys. Lett. 65, 1018 (1994).
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 1018
-
-
Warren, W.L.1
Dimos, D.2
Tuttle, B.A.3
Nasby, R.D.4
Pike, G.E.5
-
4
-
-
0030216895
-
-
D. Dimos, H. N. Al-Shareef, W. L. Warren, and B. A. Tuttle, J. Appl. Phys. 80, 1682 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 1682
-
-
Dimos, D.1
Al-Shareef, H.N.2
Warren, W.L.3
Tuttle, B.A.4
-
5
-
-
0033339701
-
-
D.-J. Kim, S.-H. Kim, J.-P. Maria, and A. I. Kingon, Integr. Ferroelectr. 25, 351 (1999).
-
(1999)
Integr. Ferroelectr.
, vol.25
, pp. 351
-
-
Kim, D.-J.1
Kim, S.-H.2
Maria, J.-P.3
Kingon, A.I.4
-
6
-
-
0040927868
-
-
D. Wu, A. Li, H. Ling, T. Yu, Z. Liu, and N. Ming, J. Appl. Phys. 90, 4130 (2001).
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 4130
-
-
Wu, D.1
Li, A.2
Ling, H.3
Yu, T.4
Liu, Z.5
Ming, N.6
-
7
-
-
0034262576
-
-
M. Tanaka, K. Hironaka, and A. Onodera, Jpn. J. Appl. Phys., Part 1 39, 5472 (2000).
-
(2000)
Jpn. J. Appl. Phys., Part 1
, vol.39
, pp. 5472
-
-
Tanaka, M.1
Hironaka, K.2
Onodera, A.3
-
8
-
-
33747179838
-
-
L. Goux, Z. Xu, V. Paraschiv, J. G. Lisoni, D. Maes, L. Haspeslagh, G. Groeseneken, and D. J. Wouters, Solid-State Electron. 50, 1227 (2006).
-
(2006)
Solid-State Electron.
, vol.50
, pp. 1227
-
-
Goux, L.1
Xu, Z.2
Paraschiv, V.3
Lisoni, J.G.4
Maes, D.5
Haspeslagh, L.6
Groeseneken, G.7
Wouters, D.J.8
-
9
-
-
0033321077
-
-
S. Okamura, S. Miyata, Y. Mizutani, T. Nishida, and T. Shiosaki, Jpn. J. Appl. Phys., Part 1 38, 5364 (1999).
-
(1999)
Jpn. J. Appl. Phys., Part 1
, vol.38
, pp. 5364
-
-
Okamura, S.1
Miyata, S.2
Mizutani, Y.3
Nishida, T.4
Shiosaki, T.5
-
10
-
-
0000924614
-
-
H. N. Al-Shareef, D. Dimos, W. L. Warren, and B. A. Tuttle, J. Appl. Phys. 80, 4573 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 4573
-
-
Al-Shareef, H.N.1
Dimos, D.2
Warren, W.L.3
Tuttle, B.A.4
-
11
-
-
12944332792
-
-
K. H. Noh, Y. M. Kang, B. Yang, S. W. Lee, S.-S. Lee, and Y.-J. Park, Jpn. J. Appl. Phys., Part 1 41, 6840 (2002).
-
(2002)
Jpn. J. Appl. Phys., Part 1
, vol.41
, pp. 6840
-
-
Noh, K.H.1
Kang, Y.M.2
Yang, B.3
Lee, S.W.4
Lee, S.-S.5
Park, Y.-J.6
-
13
-
-
0032592335
-
-
M. Grossmann, O. Lohse, D. Bolten, R. Waser, W. Hartner, G. Schindler, N. Nagel, and C. Dehm, Mater. Res. Soc. Symp. Proc. 541, 269 (1999).
-
(1999)
Mater. Res. Soc. Symp. Proc.
, vol.541
, pp. 269
-
-
Grossmann, M.1
Lohse, O.2
Bolten, D.3
Waser, R.4
Hartner, W.5
Schindler, G.6
Nagel, N.7
Dehm, C.8
-
15
-
-
24144458952
-
-
N. Menou, Ch. Turquat, V. Madigou, Ch. Muller, L. Goux, J. Lisoni, M. Schwitters, and D. J. Wouters, Appl. Phys. Lett. 87, 073502 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 073502
-
-
Menou, N.1
Turquat, Ch.2
Madigou, V.3
Muller, Ch.4
Goux, L.5
Lisoni, J.6
Schwitters, M.7
Wouters, D.J.8
-
18
-
-
0034322735
-
-
D. Wu, A. D. Li, H. Q. Ling, T. Yu, Z. G. Liu, and N. B. Ming, Appl. Phys. A: Mater. Sci. Process. 71, 597 (2000).
-
(2000)
Appl. Phys. A: Mater. Sci. Process.
, vol.71
, pp. 597
-
-
Wu, D.1
Li, A.D.2
Ling, H.Q.3
Yu, T.4
Liu, Z.G.5
Ming, N.B.6
-
19
-
-
0001253071
-
-
M. Grossmann, O. Lohse, D. Bolten, U. Boettger, R. Waser, W. Hartner, K. Kastner, and G. Schindler, Appl. Phys. Lett. 76, 363 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 363
-
-
Grossmann, M.1
Lohse, O.2
Bolten, D.3
Boettger, U.4
Waser, R.5
Hartner, W.6
Kastner, K.7
Schindler, G.8
-
20
-
-
0032155782
-
-
T. Hase, T. Noguchi, K. Takemura, and Y. Miyasaka, Jpn. J. Appl. Phys., Part 1 37, 5198 (1998).
-
(1998)
Jpn. J. Appl. Phys., Part 1
, vol.37
, pp. 5198
-
-
Hase, T.1
Noguchi, T.2
Takemura, K.3
Miyasaka, Y.4
-
21
-
-
19944370507
-
-
L. Goux, Z. Xu, B. Kaczer, G. Groeseneken, and D. J. Wouters, Microelectron. Eng. 80C, 162 (2005).
-
(2005)
Microelectron. Eng.
, vol.80
, pp. 162
-
-
Goux, L.1
Xu, Z.2
Kaczer, B.3
Groeseneken, G.4
Wouters, D.J.5
-
22
-
-
33746274042
-
-
W.-C. Shin, N.-J. Seong, K.-J. Choi, and S.-G. Yoon, Ferroelectrics 271, 341 (2002).
-
(2002)
Ferroelectrics
, vol.271
, pp. 341
-
-
Shin, W.-C.1
Seong, N.-J.2
Choi, K.-J.3
Yoon, S.-G.4
-
24
-
-
0000645050
-
-
K. Watanabe, A. J. Hartmann, R. N. Lamb, and J. F. Scott, J. Appl. Phys. 84, 2170 (1998).
-
(1998)
J. Appl. Phys.
, vol.84
, pp. 2170
-
-
Watanabe, K.1
Hartmann, A.J.2
Lamb, R.N.3
Scott, J.F.4
-
25
-
-
0030244584
-
-
J. Robertson, C. W. Chen, W. L. Warren, and C. D. Gutleben, Appl. Phys. Lett. 69, 1704 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 1704
-
-
Robertson, J.1
Chen, C.W.2
Warren, W.L.3
Gutleben, C.D.4
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