Immersion patterning down to 27 nm half pitch

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2789-2797

  Bloomstein, T M ^a   Fedynyshyn, T H ^a   Pottebaum, I ^a   Marchant, M F ^a   Deneault, S J ^a   Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DIFFRACTION GRATINGS; DOPING (ADDITIVES); FUSED SILICA; PRISMS; THIN FILMS;

IMMERSION PATTERNING; LIQUID IMMERSION INTERFERENCE LITHOGRAPHY; ORGANOSILOXANES; PRINT GRATINGS;

LITHOGRAPHY;

EID: 33845246167     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366678     Document Type: Article

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