High-throughput hybrid optical maskless lithography: All-optical 32-nm node imaging

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1058-1068

  Fritze, M ^a   Tyrrell, B ^a   Fedynyshyn, T ^a   Rothschild, M ^a   Brooker, P ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Sigma CAD Inc   (United States)

Author keywords

Hybrid lithography; Interference lithography; Optical maskless lithography; Resolution enhancement

Indexed keywords

HYBRID LITHOGRAPHY; INTERFERENCE LITHOGRAPHY; OPTICAL MASKLESS LITHOGRPHY; RESOLUTION ENHANCEMENT;

COMPUTER SIMULATION; IMAGING SYSTEMS; MASKS; OPTICAL RESOLVING POWER; SIGNAL INTERFERENCE;

LITHOGRAPHY;

EID: 24644494197     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.612856     Document Type: Conference Paper

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