Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: Fundamentals of transparency

Journal of Fluorine Chemistry

Volumn 122, Issue 1, 2003, Pages 63-80

  French, Roger H ^a   Wheland, Robert C ^a   Qiu, Weiming ^a   Lemon, M F ^a   Zhang, Edward ^b   Gordon, Joseph ^b   Petrov, Viacheslav A ^a   Cherstkov, Victor F ^c   Delaygina, Nina I ^c  

^a DUPONT COMPANY   (United States)

^b DuPont Photomasks Inc   (United States)

^c A N NESMEYANOV INSTITUTE OF ORGANOELEMENT COMPOUNDS   (Russian Federation)

Author keywords

157 nm; Fluoropolymer; Hydrofluorocarbon; Optical absorbance; Pellicle; Photolithography

Indexed keywords

CYCLOBUTANE; ETHER; FLUORINATED HYDROCARBON; FLUOROCARBON; ISOBUTYLENE; METHYL GROUP; MONOMER; OXYGEN; PERFLUORO COMPOUND; POLITEF; POLYMER; PYROXYLIN; TRACE ELEMENT; VINYLIDENE FLUORIDE; WATER;

ARTICLE; CHEMICAL BOND; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; CONTROLLED STUDY; DUST; ELECTRONICS INDUSTRY; FILM; INTEGRATED CIRCUIT; IRRADIATION; LIGHT ABSORPTION; MASK; MOLECULAR WEIGHT; PHOTOCHEMISTRY; POLLUTION; QUANTUM YIELD; RADIATION; RADIATION DOSE; RADIATION EXPOSURE; SEMICONDUCTOR; SPECTRAL SENSITIVITY; SURFACE PROPERTY; THICKNESS;

EID: 0037971806     PISSN: 00221139     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-1139(03)00081-2     Document Type: Article

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