Pattern transfer processes for 157-nm lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 3, 2002, Pages 276-283

  Miyoshi, Seiro ^a   Furukawa, Takamitsu ^a   Watanabe, Hiroyuki ^a   Irie, Shigeo ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157 nm lithography; Bi layer process; Fluoropolymer; Gate fabrication; Hard mask; Pattern transfer

Indexed keywords

EID: 33845271847     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1507336     Document Type: Article

References (20)

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