Evaluation of novel fluorinated resist matrices for 157 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 22-32

  Houlihan, Francis ^a   Romano, Andrew ^a   Rentkiewicz, David ^a   Sakamuri, Raj ^a   Dammel, Ralph R ^a   Conley, Will ^b   Rich, Georgia ^b   Miller, Daniel ^b   Rhodes, Larry ^c   McDaniels, Joe ^c   ChungChang, ^c  

^a CLARIANT CORPORATION   (United States)

^b SEMATECH   (United States)

^c Promerus LLC   (United States)

Author keywords

157 nm; High transparency; Resist

Indexed keywords

DRY ETCHING; FLUORINE CONTAINING POLYMERS; OXIDES; POLYMERIZATION; POLYSILICON; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; TRANSPARENCY;

DRY ETCH RESISTANCE; TRANSPARENT PERFLUORINATED RESIN;

PHOTORESISTS;

EID: 0141608676     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485195     Document Type: Conference Paper

References (5)

1. Hoang V. Tran, Raymond J. Hung, Takashi Chiba, Shitaro Yamada, Thomas Mrozek, Yu-Tsai Hsieh, Charles R. Chambers, Brian P. Osborn, Brian C. Trique, Matthew J. Pinnow, Scott A. MacDonald, C. Gramt Willson, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, Will Conley Macromolecules 35, 6539 (2002).
2. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji Okada, Yasuhide, Kawaguchi, Naomi Schida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani, Advances in Resist Technology and Processing XIX, Proceedings of SPIE Vol 4690 p 76 (2002).
3. 3rd International Symposium on 157 nm Lithography, 3-6 September 2002, "Advances in Fluorinated Polymers for 157 nm Lithography a Progress Report," given by Will Conley et al
4. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph T. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniesl, ChunChang, Advances in Resist Technology and Processing XX, Proceedings of SPIE (2003) in press
5. Ralph Dammel, Raj Sakamuri, Andrew Romano, Richard Vicari, Cheryl Hacker, Will Conley and Daniel Miller, Advances in Resist Technology and Processing XVII, Proceedings of SPIE Vol 44345 p351 (2001).