New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4099, Issue , 2000, Pages 206-217

  Boher, Pierre ^a   Evrard, Patrick ^a   Piel, Jean Philippe ^a   Stehle, Jean Louis ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; MONOCHROMATORS; MULTILAYERS; PHOTOLITHOGRAPHY; PHOTOMETRY; POLARIMETERS; POLARIZATION; SYNCHROTRONS; THIN FILMS;

ULTRAVIOLET SPECTROSCOPIC ELLIPSOMETERS;

ELLIPSOMETRY;

EID: 0034538730     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405821     Document Type: Conference Paper

References (15)