Direct patterning of spin-on glass with 157 nm lithography: Application to nanoscale crystal growth

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2617-2623

  Bloomstein, T M ^a   Juodawlkis, P W ^a   Swint, R B ^a   Cann, S G ^a   Deneault, S J ^a   Efremow, N N ^a   Hardy, D E ^a   Marchant, M F ^a   Napoleone, A ^a   Oakley, D C ^a   Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAKE TEMPERATURE; HYDROGEN SILSESQUIOXANE (HSQ);

CRYSTAL GROWTH; HYDROGEN; LITHOGRAPHY; OPTIMIZATION; OXYGEN;

GLASS;

EID: 29044444756     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2101692     Document Type: Article

References (13)

1. H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase, and K. Kurihara, J. Vac. Sci. Technol. B 16, 69 (1998).
2. W. Henschel, Y. M. Georgiev, and H. Kurz, J. Vac. Sci. Technol. B 21, 2018 (2003).
3. G. M. Schmid, L. E. Carpenter II, and J. A. Liddle, J. Vac. Sci. Technol. B 22, 3497 (2004).
4. D. J. Resnick, D. Mancini, W. J. Dauksher, K. Nordquist, T. C. Bailey, S. Johnson, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, Microelectron. Eng. 69, 412 (2003).
5. M. Peuker, M. H. Lim, H. I. Smith, R. Morton, A. K. van Langen-Suurling, J. Romijn, E. W. J. M. van der Drift, and F. C. M. J. M. van Delft, Microelectron. Eng. 61-62, 803 (2002).
6. M. J. Loboda, C. M. Grove, and R. F. Schneider, J. Electrochem. Soc. 145, 2861 (1998).
7. J. Meute, G. K. Rich, S. Hien, K. R. Dean, C. Gondran, J. S. Cashmore, D. Ashworth, J. E. Webb, L. R. Rich, and P. G. Dewa, Proc. SPIE 4691, 724 (2002).
8. T. M. Bloomstein, V. Liberman, M. Rothschild, S. T. Palmacci, D. E. Hardy, and J. H. C. Sedlacek, Proc. SPIE 4691, 709 (2002).
9. H. C. Liou and J. Pretzer, Thin Solid Films 335, 186 (1998).
10. V. Liberman, M. Rothschild, S. T. Palmacci, N. N. Efremow, J. H. C. Sedlacek, and A. Grenville, Proc. SPIE 5040, 487 (2003).
11. C. C. Yang and W. C. Chen, J. Mater. Chem. 12, 1138 (2002).
12. M. Switkes, T. M. Bloomstein, and M. Rothschild, Proc. SPIE 4000, 1590 (2000).
13. M. Switkes and M. Rothschild, J. Vac. Sci. Technol. B 19, 2353 (2001).